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公开(公告)号：US11635681B2
公开(公告)日：2023-04-25
申请号：US17375283
申请日：2021-07-14
Applicant: ASML Netherlands B.V.
Inventor： Derk Servatius Gertruda Brouns , Dennis De Graaf , Robertus Cornelis Martinus De Kruif , Paul Janssen , Matthias Kruizinga , Arnoud Willem Notenboom , Daniel Andrew Smith , Beatrijs Louise Marie-Joseph Katrien Verbrugge , James Norman Wiley
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：US12072620B2
公开(公告)日：2024-08-27
申请号：US17278356
申请日：2019-10-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter-Jan Van Zwol , Sander Baltussen , Dennis De Graaf , Johannes Christiaan Leonardus Franken , Adrianus Johannes Maria Giesbers , Alexander Ludwig Klein , Johan Hendrik Klootwijk , Peter Simon Antonius Knapen , Evgenia Kurganova , Alexey Sergeevich Kuznetsov , Arnoud Willem Notenboom , Mahdiar Valefi , Marcus Adrianus Van de Kerkhof , Wilhelmus Theodorus Anthonius Johannes Van den Einden , Ties Wouter Van der Woord , Hendrikus Jan Wondergem , Aleksandar Nikolov Zdravkov
CPC classification number: G03F1/64 , G03F7/7015
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.
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公开(公告)号：US20240369920A1
公开(公告)日：2024-11-07
申请号：US18774721
申请日：2024-07-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter-Jan VAN ZWOL , Sander Baltussen , Dennis De Graaf , Johannes Christiaan Leonardus Franken , Adrianus Johannes Maria Giesbers , Alexander Ludwig Klein , Johan Hendrik Klootwijk , Peter Simon Antonius Knapen , Evgenia Kurganova , Alexey Sergeevich Kuznetsov , Arnoud Willem Notenboom , Mahdiar Valefi , Marcus Adrianus Van De Kerkhof , Wilhelmus Theodorus Anthonius Johannes Van Den Einden , Ties Wouter Van Der Woord , Hendrikus Jan Wondergem , Aleksandar Nikolov Zdravkov
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.
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公开(公告)号：US11320731B2
公开(公告)日：2022-05-03
申请号：US16060635
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter-Jan Van Zwol , Dennis De Graaf , Paul Janssen , Mária Péter , Marcus Adrianus Van De Kerkhof , Willem Joan Van Der Zande , David Ferdinand Vles , Willem-Pieter Voorthuijzen
Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and including a stack having: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine.
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公开(公告)号：US11237475B2
公开(公告)日：2022-02-01
申请号：US16758250
申请日：2018-11-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Zomer Silvester Houweling , Chaitanya Krishna Ande , Dennis De Graaf , Thijs Kater , Michael Alfred Josephus Kuijken , Mahdiar Valefi
IPC: G03F1/62
Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.
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Patent Agency Ranking
公开(公告)号：US10095119B2
公开(公告)日：2018-10-09
申请号：US14442415
申请日：2013-10-23
Applicant: ASML Netherlands B.V.
Inventor： Hendrikus Gijsbertus Schimmel , Michel Riepen , Reinier Theodorus Martinus Jilisen , Dennis De Graaf
Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.
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公开(公告)号：US11977326B2
公开(公告)日：2024-05-07
申请号：US17048875
申请日：2019-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Dennis De Graaf , Richard Beaudry , Maxime Biron , Paul Janssen , Thijs Kater , Kevin Kornelsen , Michael Alfred Josephus Kuijken , Jan Hendrik Willem Kuntzel , Stephane Martel , Maxim Aleksandrovich Nasalevich , Guido Salmaso , Pieter-Jan Van Zwol
CPC classification number: G03F1/64 , G03F1/62 , G03F7/70983
Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.
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公开(公告)号：US11567399B2
公开(公告)日：2023-01-31
申请号：US17566764
申请日：2021-12-31
Applicant: ASML NETHERLANDS B.V.
Inventor： Zomer Silvester Houweling , Chaitanya Krishna Ande , Dennis De Graaf , Thijs Kater , Michael Alfred Josephus Kuijken , Mahdiar Valefi
IPC: G03F1/62
Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.
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公开(公告)号：US11086213B2
公开(公告)日：2021-08-10
申请号：US16798688
申请日：2020-02-24
Applicant: ASML Netherlands B.V.
Inventor： Derk Servatius Gertruda Brouns , Dennis De Graaf , Robertus Cornelis Martinus De Kruif , Paul Janssen , Matthias Kruizinga , Amoud Willem Notenboom , Daniel Andrew Smith , Beatrijs Louise Marie-Joseph Katrien Verbrugge , James Norman Wiley
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：US11029595B2
公开(公告)日：2021-06-08
申请号：US16707201
申请日：2019-12-09
Applicant: ASML Netherlands B.V.
Inventor： Derk Servatius Gertruda Brouns , Dennis De Graaf , Robertus Cornelis Martinus De Kruif , Paul Janssen , Matthias Kruizinga , Arnoud Willem Notenboom , Daniel Andrew Smith , Beatrijs Louise Marie-Joseph Katrien Verbrugge , James Norman Wiley
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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