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公开(公告)号：US10078272B2
公开(公告)日：2018-09-18
申请号：US15527264
申请日：2015-11-02
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/70425 , G03F7/20 , G03F7/70491 , G03F7/706
Abstract: A method of correcting aberrations caused by a projection system of a lithographic apparatus, the method including performing a measurement of an aberration caused by the projection system using a sensor located in the lithographic apparatus, determining, based on a history of operation of the lithographic apparatus since a change of machine state, whether to average the measured aberration with one or more aberration measurements previously obtained using the sensor, calculating a correction to be applied to the lithographic apparatus using the measured aberration if it is determined that averaging should not be performed, calculating a correction to be applied to the lithographic apparatus using an averaged aberration measurement if it is determined that averaging should be performed, and applying the calculated correction to the lithographic apparatus.
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Patent Agency Ranking
公开(公告)号：US11237490B2
公开(公告)日：2022-02-01
申请号：US16084596
申请日：2017-01-26
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Bearrach Moest , Lowell Lane Baker , James Robert Downes , Wijnand Hoitinga , Hermen Folken Pen
IPC: G03F7/20
Abstract: An apparatus including an illumination system to condition a radiation beam, a support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control system configured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signal to control a component of the apparatus based on the deformation of the pattern.
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公开(公告)号：US11126091B2
公开(公告)日：2021-09-21
申请号：US16969078
申请日：2019-01-28
Applicant: ASML Netherlands B.V.
Inventor： Martijn Cornelis Schaafsma , Mhamed Akhssay , James Robert Downes
Abstract: A method of calibrating a projection system heating model to predict an aberration in a projection system in a lithographic apparatus, the method comprising passing exposure radiation through a projection system to expose one or more exposure fields on a substrate provided on a substrate table, making measurements of the aberration in the projection system caused by the exposure radiation, wherein the time period between measurements is less than the time period that would be taken to expose all exposure fields on the substrate.
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公开(公告)号：US11036144B2
公开(公告)日：2021-06-15
申请号：US16955324
申请日：2018-12-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Przemyslaw Aleksander Klosiewicz , Bogathi Vishnu Vardhana Reddy , Syed Umar Hassan Rizvi , James Robert Downes
IPC: G03F7/20
Abstract: A method of determining a configuration of a projection system for a lithographic apparatus as an implementation of a quadratic programming problem with a penalty function. The method includes: receiving dependencies of one or more optical properties of the projection system on a configuration of a plurality of manipulators of the projection system; receiving a plurality of constraints which correspond to physical constraints of the manipulators; finding an initial configuration of the manipulators; and iteratively finding an output configuration of the manipulators. The iteration includes repeating the following steps: determining a set of the plurality of constraints that are violated; determining an updated configuration of the manipulators, the updated configuration of the manipulators being dependent on the set of the plurality of constraints that are violated and a penalty strength; and increasing the penalty strength. These steps are repeated until a convergence criterion is met.
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公开(公告)号：US11022895B2
公开(公告)日：2021-06-01
申请号：US16644135
申请日：2018-08-14
Applicant: ASML Netherlands B.V.
Inventor： Pierluigi Frisco , Giovanni Imponente , James Robert Downes
Abstract: A method comprising determining aberrations caused by each lithographic apparatus of a set of lithographic apparatuses, calculating adjustments of the lithographic apparatuses which minimize differences between the aberrations caused by each of the lithographic apparatuses, and applying the adjustments to the lithographic apparatuses, providing better matching between the aberrations of patterns projected by the lithographic apparatuses.
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公开(公告)号：US10948832B2
公开(公告)日：2021-03-16
申请号：US16500933
申请日：2018-03-06
Applicant: ASML Netherlands B.V.
Inventor： Nick Kant , Robertus Martinus Alphonsus Van Herpen , Mark Louwrens Beks , Lense Hendrik-Jan Maria Swaenen , Nico Vanroose , James Robert Downes
IPC: G03F7/20
Abstract: A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second component, wherein the first component of the aberration signal comprises a first frequency band and the second component of the aberration signal comprises a second frequency band, wherein the first frequency band comprises frequencies that are higher than frequencies comprised in the second frequency band, calculating a correction, wherein a first part of the correction is calculated based on the first component of the aberration signal, and applying the correction to the lithographic apparatus.
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