公开(公告)号：US20240411222A1

公开(公告)日：2024-12-12

申请号：US18699574

申请日：2022-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Inci DONMEZ NOYAN ,  Ties Wouter VAN DER WOORD ,  Johan REININK ,  Tim Willem Johan VAN DE GOOR ,  Alexander Ludwig KLEIN ,  Zomer Silvester HOUWELING ,  Paul Alexander VERMEULEN ,  Adrianus Johannes Maria GIESBERS ,  Johan Hendrik KLOOTWIJK ,  Lambertus Idris Johannes Catharina BERGERS

IPC: G03F1/62 ,  C04B35/58

Abstract: A pellicle membrane includes a population of metal silicide crystals in a silicon-based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：US20220397834A1

公开(公告)日：2022-12-15

申请号：US17774743

申请日：2020-10-20

Applicant: ASML Netherlands B.V.

Inventor： Johan REININK ,  Jeroen COTTAAR ,  Sjoerd Nicolaas Lambertus DONDERS ,  Sietse Thijmen VAN DER POST

IPC: G03F9/00 ,  G03F7/20

Abstract: Apparatus and method for measuring one or more parameters of a substrate (300) using source radiation emitted from a radiation source (100) and directed onto the substrate. The apparatus comprises at least one reflecting element (710a) and at least one detector (720, 721). The at least one reflecting element is configured to receive a reflected radiation resulting from reflection of the source radiation from the substrate and further reflect the reflected radiation into a further reflected radiation. The at least one detector is configured for measurement of the further reflected radiation for determination of at least an alignment of the source radiation and/or the substrate

公开(公告)号：US20240168392A1

公开(公告)日：2024-05-23

申请号：US18277188

申请日：2022-01-12

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Johan REININK ,  Marinus Petrus REIJNDERS ,  Han-Kwang NIENHUYS ,  David O'DWYER ,  Sander Bas ROOBOL ,  Christina Lynn PORTER ,  Stephen EDWARD

IPC: G03F7/00 ,  G21K1/10

CPC classification number: G03F7/706849 ,  G03F7/70233 ,  G03F7/70308 ,  G03F7/70316 ,  G21K1/10

Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.