公开(公告)号：US20230091648A1

公开(公告)日：2023-03-23

申请号：US18070155

申请日：2022-11-28

Applicant: ASML Netherlands B.V.

Inventor： Sander Catharina Reinier DERKS ,  Daniel Jozef Maria DIRECKS ,  Maurice Wilhelmus Leonardus Hendricus FEIJTS ,  Pieter Gerardus Mathijs HOEIJMAKERS ,  Katja Cornelia Joanna Clasina MOORS ,  Violeta NAVARRO PAREDES ,  William Peter VAN DRENT ,  Jan Steven Christiaan WESTERLAKEN

IPC: G03F7/20 ,  H05G2/00

Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1 K−1.

公开(公告)号：US20250021026A1

公开(公告)日：2025-01-16

申请号：US18711842

申请日：2022-11-18

Applicant: ASML Netherlands B.V.

Inventor： William Peter VAN DRENT ,  Jan Steven Christiaan WESTERLAKEN ,  Daniel Jozef Maria DIRECKS ,  Johannes Henricus Wilhelmus JACOBS ,  Maurice Wilhelmus Leonardus Hendricus FEIJTS ,  Edwin Johan BUIS ,  Bart Leonardus KNAPEN ,  Nicolaas Johannes Wilhelmus REUVERS ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN

IPC: G03F7/00 ,  H05G2/00

Abstract: The present invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising a first reservoir, a pressurizing system configured to pressurize a hydraulic fluid, and a separating device configured to separate the hydraulic fluid from the liquid target material in the first reservoir and to transfer a pressure from the hydraulic fluid to the liquid target material. The invention also relates to an associated method of supplying liquid target material to a radiation source.

公开(公告)号：US20160170314A1

公开(公告)日：2016-06-16

申请号：US15014829

申请日：2016-02-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Siegfried Alexander TROMP ,  Jacobus Josephus LEIJSSEN ,  Elisabeth Corinne RODENBURG ,  Maurice Wilhelmus Leonardus Hendricus FEIJTS ,  Hendrik HUISMAN

IPC: G03F7/20 ,  B05D3/02

CPC classification number: G03F7/70716 ,  B05D3/02 ,  G01J5/0285 ,  G01J5/20 ,  G03F7/70341 ,  G03F7/70708

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.

Abstract translation: 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层为形成电子部件的薄膜叠层的形成提供光滑的表面。 薄膜堆叠包括（可选）隔离层，形成电极的金属层，传感器，加热器，晶体管或逻辑器件以及顶部隔离层。