公开(公告)号：US20160139514A1

公开(公告)日：2016-05-19

申请号：US14942679

申请日：2015-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Joost Jeroen OTTENS ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/7075 ,  G03F9/7046

Abstract: A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate, A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.

Abstract translation: 光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。 为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构，基板的电平参数（例如基板的厚度）由诸如厚度传感器的传感器 。 通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此 使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。

公开(公告)号：US09494875B2

公开(公告)日：2016-11-15

申请号：US14349900

申请日：2012-09-19

Applicant: ASML Netherlands B.V.

Inventor： Sebastiaan Maria Johannes Cornelissen ,  Noud Jan Gilissen ,  Anko Jozef Cornelus Sijben ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Arnoud Willem Notenboom ,  Ronald Van Der Wilk ,  Manon Elise Will

IPC: G03F7/20 ,  H01L21/683 ,  G10L15/08 ,  G10L15/22

CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/70875 ,  G03F7/70908 ,  G10L15/08 ,  G10L2015/223 ,  H01L21/6831

Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.

Abstract translation: 公开了一种卡盘，卡盘控制系统，光刻设备和使用卡盘的方法。 在一个实施例中，提供了一种用于通过静电力将图案形成装置（MA）或基板（W）保持在光刻设备（100）的支撑台（MT，WT）上的卡盘，其中 图案形成装置用于在其横截面中赋予具有图案的辐射束（B）以形成图案化的辐射束，并且该衬底用于接收图案化的辐射束; 所述卡盘包括：电介质构件（45）; 形成在卡盘内的温度调节流体通道（48） 用于在驱动电极和图案形成装置或基板之间跨越电介质构件施加电位差的驱动电极（40,42），以便静电地将图案形成装置或衬底吸引到驱动电极; 以及第一屏蔽电极（60），用于由于施加到驱动电极的电压而减少或防止温度调节流体通道中温度调节流体的电场的发展，以便减少或防止流体中的电解。

公开(公告)号：US20140253900A1

公开(公告)日：2014-09-11

申请号：US14349900

申请日：2012-09-19

Applicant: ASML Netherlands B.V.

Inventor： Sebastiaan Maria Johannes Cornelissen ,  Noud Jan Gilissen ,  Anko Jozef Cornelus Sijben ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Arnoud Willem Notenboom ,  Ronald Van Der Wilk ,  Manon Elise Will

IPC: G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/70875 ,  G03F7/70908 ,  G10L15/08 ,  G10L2015/223 ,  H01L21/6831

Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.

Abstract translation: 公开了一种卡盘，卡盘控制系统，光刻设备和使用卡盘的方法。 在一个实施例中，提供了一种用于通过静电力将图案形成装置（MA）或基板（W）保持在光刻设备（100）的支撑台（MT，WT）上的卡盘，其中 图案形成装置用于在其横截面中赋予具有图案的辐射束（B）以形成图案化的辐射束，并且该衬底用于接收图案化的辐射束; 所述卡盘包括：电介质构件（45）; 形成在卡盘内的温度调节流体通道（48） 用于在驱动电极和图案形成装置或基板之间跨越电介质构件施加电位差的驱动电极（40,42），以便静电地将图案形成装置或衬底吸引到驱动电极; 以及第一屏蔽电极（60），用于由于施加到驱动电极的电压而减少或防止温度调节流体通道中温度调节流体的电场的发展，以便减少或防止流体中的电解。

公开(公告)号：US09581916B2

公开(公告)日：2017-02-28

申请号：US14942679

申请日：2015-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Joost Jeroen Ottens ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders ,  Koen Jacobus Johannes Maria Zaal

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/7075 ,  G03F9/7046

Abstract: A substrate handling system for an apparatus, the substrate handling system including a substrate table constructed to hold a substrate, a surrounding structure configured to surround the substrate, a sensor configured to determine a thickness of the substrate, and a control system configured to configure the apparatus responsive to a determination that the determined thickness is outside a thickness range associated with the surrounding structure.

Abstract translation: 一种用于装置的基板处理系统，所述基板处理系统包括构造成保持基板的基板台，构造成围绕所述基板的周围结构，被配置为确定所述基板的厚度的传感器以及被配置为 响应于确定所确定的厚度在与周围结构相关联的厚度范围之外的装置。