公开(公告)号：US20040189972A1

公开(公告)日：2004-09-30

申请号：US10746156

申请日：2003-12-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Catharinus Hubertus Mulkens ,  Paul Van Der Veen ,  Roel De Jonge ,  Roland Pieter Stolk

IPC: G03B027/72

CPC classification number: G03F7/70558

Abstract: A lithographic projection apparatus is provided with a sensor for detecting one of luminescence radiation, desorbed particles, or free charges produced by an interaction of the projection beam with a material at surface of a substrate. The luminescence radiation, desorbed particles, or free charges are indicative of the dose delivered to the substrate, and can be detected close to the substrate or at the substrate level to avoid errors due to transmission variations in the optical path from the radiation source to the substrate.

Abstract translation: 光刻投影装置设置有用于检测发光辐射，解吸颗粒或由投影束与衬底表面处的材料的相互作用产生的自由电荷之一的传感器。 发光辐射，解吸颗粒或自由电荷指示输送到衬底的剂量，并且可以在衬底附近或在衬底水平处被检测，以避免由于从辐射源到辐射源的光路中的透射变化的错误 基质。

公开(公告)号：US20040160583A1

公开(公告)日：2004-08-19

申请号：US10719065

申请日：2003-11-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Catharinus Hubertus Mulkens ,  Paul Van Der Veen ,  Willem Van Schaik ,  Eric Catey ,  Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Heine Melle Mulder

IPC: G03B027/52

CPC classification number: G03F7/70558 ,  G03F7/70883 ,  G03F7/70933 ,  G03F7/70941

Abstract: In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses and the radiation may be used to measure the energy of the radiation with minimal disruption to the radiation.

Abstract translation: 在光刻投影系统中，需要准确地控制传送到基板的辐射能量。 通过将吸收气体注入到辐射通过的体积中的衰减是控制能量的便利方式。 此外，气体和辐射之间的相互作用可用于以最小的辐射破坏来测量辐射的能量。