公开(公告)号：US20040160583A1

公开(公告)日：2004-08-19

申请号：US10719065

申请日：2003-11-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Catharinus Hubertus Mulkens ,  Paul Van Der Veen ,  Willem Van Schaik ,  Eric Catey ,  Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Heine Melle Mulder

IPC: G03B027/52

CPC classification number: G03F7/70558 ,  G03F7/70883 ,  G03F7/70933 ,  G03F7/70941

Abstract: In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses and the radiation may be used to measure the energy of the radiation with minimal disruption to the radiation.

Abstract translation: 在光刻投影系统中，需要准确地控制传送到基板的辐射能量。 通过将吸收气体注入到辐射通过的体积中的衰减是控制能量的便利方式。 此外，气体和辐射之间的相互作用可用于以最小的辐射破坏来测量辐射的能量。

公开(公告)号：US20040141165A1

公开(公告)日：2004-07-22

申请号：US10673644

申请日：2003-09-30

Applicant: ASML Netherlands B.V.

Inventor： Givi Georgievitch Zukavishvili ,  Vladimir Vital?apos;Evitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Evgenil Dmitreevitch Korob ,  Vadim Yevgenyevich Banine ,  Pavel Stanislavovich Antsiferov

IPC: G03B027/42

CPC classification number: H05G2/003 ,  B82Y10/00 ,  F28D15/0266 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005

Abstract: A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium, tin or any suitable material. To improve conversion efficiency, the source unit may be constructed to have a low inductance, and operated with a minimum of plasma. To, for example, improve heat dissipation, a fluid circulation system can be created within the source volume and a wick by using a fluid in both its vapor and liquid states. To, for example, prevent contamination from entering a lithographic projection apparatus, the source unit can be constructed to minimize the production of contamination, and a trap can be employed to capture the contamination without interfering with the emitted radiation.

Abstract translation: 提供了一种辐射源单元，其包括阳极和阴极，所述阳极和阴极被配置和布置成在所述阳极和阴极之间的空间中的物质中产生放电并形成等离子体以产生电磁辐射。 该物质可以包括氙，铟，锂，锡或任何合适的材料。 为了提高转换效率，源单元可被构造为具有低电感，并且以最小的等离子体运行。 例如，为了改善散热，可以通过在其蒸汽和液态中使用流体在源体积和芯中产生流体循环系统。 例如，为了防止污染物进入光刻投影设备，可以构建源单元以使污染物的产生最小化，并且捕集器可用于捕获污染物而不干扰所发射的辐射。

公开(公告)号：US20040108465A1

公开(公告)日：2004-06-10

申请号：US10644954

申请日：2003-08-21

Applicant: ASML NETHERLANDS B.V

Inventor： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Vadim Yevgenyevich Banine

IPC: A61N005/00 ,  G21G005/00

CPC classification number: G03F7/70166 ,  G03F7/70058 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70916 ,  G03F7/70983

Abstract: A lithographic projection apparatus for EUV lithography includes a foil trap. The foil trap forms an open structure after the EUV source to let the EUV radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the EUV radiation can be transferred on debris present in the EUV beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced.

Abstract translation: 用于EUV光刻的光刻投影装置包括箔陷阱。 在EUV源之后，箔陷阱形成开放结构，以使EUV辐射不受阻碍地通过。 箔捕获器被配置为围绕光轴可旋转。 通过旋转箔阱，可以在EUV波束中存在的碎片上传输横向于EUV辐射传播方向的脉冲。 这个碎片不会通过箔片陷阱。 以这种方式，箔陷阱下游的光学部件上的碎屑的量减少。

公开(公告)号：US20040032574A1

公开(公告)日：2004-02-19

申请号：US10641306

申请日：2003-08-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Norbertus Benedictus Koster ,  Bastiaan Matthias Mertens ,  Martinus Hendrikus Antonius Leenders ,  Vladimir Vital?apos;evitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vadim Yevgenyevich Banine

IPC: G03B027/52

CPC classification number: G03F7/70908 ,  G03F7/70916 ,  G03F7/70933

Abstract: Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.

Abstract translation: 在光刻投影装置中用投影光束行进的污染物颗粒被电离。 清洗气体可能被吸引到设置在净化气体供应源上游的吸气板。 磁场捕获由电离器产生的电子以改善净化气体的离子化。 可以通过在具有比宽度更大的长度的管中产生等离子体来使污染物颗粒离子化。

公开(公告)号：US20040257546A1

公开(公告)日：2004-12-23

申请号：US10817969

申请日：2004-04-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich Banine

IPC: G03B027/54

CPC classification number: G03F7/70175

Abstract: An optical system includes a radiation source and at least one collector located in the vicinity of the radiation source. The collector is arranged to collect the radiation to provide a beam of radiation. The at least one collector includes a first reflector on a concave surface and a second reflector on a convex surface, the convex surface surrounding the concave surface.

Abstract translation: 光学系统包括辐射源和位于辐射源附近的至少一个收集器。 收集器被布置成收集辐射以提供辐射束。 所述至少一个收集器包括凹面上的第一反射器和凸表面上的第二反射器，所述凸表面围绕所述凹表面。

公开(公告)号：US20040109149A1

公开(公告)日：2004-06-10

申请号：US10716443

申请日：2003-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Van Elp ,  Martinus Hendrikus Antonius Leenders ,  Vadim Yevgenyevich Banine ,  Hugo Matthieu Visser ,  Levinus Pieter Bakker

IPC: G03B027/54 ,  G03B027/72

CPC classification number: G03F7/70575 ,  G03F7/70191 ,  G03F7/702

Abstract: In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.

公开(公告)号：US20020154279A1

公开(公告)日：2002-10-24

申请号：US10036497

申请日：2002-01-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Norbertus Benedictus Koster ,  Bastiaan Matthias Mertens ,  Martinus Hendrikus Antonius Leenders ,  Vladimir Vital?apos;evitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vadim Yevgenyevich Banine

IPC: G03B027/52

CPC classification number: G03F7/70908 ,  G03F7/70916 ,  G03F7/70933

Abstract: Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.

Abstract translation: 在光刻投影装置中用投影光束行进的污染物颗粒被电离。 清洗气体可能被吸引到设置在净化气体供应源上游的吸气板。 磁场捕获由电离器产生的电子以改善净化气体的离子化。 可以通过在具有比宽度更大的长度的管中产生等离子体来使污染物颗粒离子化。