公开(公告)号：US11988971B2

公开(公告)日：2024-05-21

申请号：US17612679

申请日：2020-05-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Matthew Lipson ,  Satish Achanta ,  Benjamin David Dawson ,  Matthew Anthony Sorna ,  Iliya Sigal ,  Tammo Uitterdijk

IPC: G03F7/00

CPC classification number: G03F7/70716

Abstract: A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.

公开(公告)号：US11086234B2

公开(公告)日：2021-08-10

申请号：US16758917

申请日：2018-10-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas Poiesz ,  Satish Achanta ,  Jeroen Bouwknegt ,  Abraham Alexander Soethoudt

IPC: G03B27/58 ,  G03F7/20

Abstract: A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.

公开(公告)号：US09798251B2

公开(公告)日：2017-10-24

申请号：US14772721

申请日：2014-02-26

Applicant: ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis LaFarre ,  Satish Achanta ,  Matteo Filippi ,  Yogesh Karade ,  Antonius Johannes Maria Nellissen ,  Ronald Van Der Wilk ,  Hendrikus Christoffel Maria Van Doremalen ,  Wilhelmus Jacobus Johannes Welters

IPC: G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70708

Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.

公开(公告)号：US12117736B2

公开(公告)日：2024-10-15

申请号：US17621472

申请日：2020-06-05

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus Van De Kerkhof ,  Satish Achanta ,  Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Stef Marten Johan Janssens ,  Andrey Nikipelov

IPC: G03F7/00 ,  G03F1/82 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/707 ,  G03F1/82 ,  H01L21/6831 ,  H01L21/68721

Abstract: A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.

公开(公告)号：US20220342315A1

公开(公告)日：2022-10-27

申请号：US17621472

申请日：2020-06-05

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus Van De Kerkhof ,  Satish Achanta ,  Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Stef Marten Johan Janssens ,  Andrey Nikipelov

IPC: G03F7/20 ,  H01L21/683 ,  G03F1/82 ,  H01L21/687

Abstract: A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.

公开(公告)号：US10719019B2

公开(公告)日：2020-07-21

申请号：US16315125

申请日：2017-07-06

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Thomas Poiesz ,  Satish Achanta ,  Mehmet Ali Akbas ,  Pavlo Antonov ,  Jeroen Bouwknegt ,  Joost Wilhelmus Maria Frenken ,  Evelyn Wallis Pacitti ,  Nicolaas Ten Kate ,  Bruce Tirri ,  Jan Verhoeven

IPC: G03F7/20 ,  H01L21/687

Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material. The layer of carbon based material provides a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material. The layer of carbon based material covers only part of the distal end surface of at least one of the burls. Alternatively, the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.

公开(公告)号：US10192772B2

公开(公告)日：2019-01-29

申请号：US15766740

申请日：2016-09-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Satish Achanta ,  Tiannan Guan ,  Raymond Wilhelmus Louis LaFarre ,  Ilya Malakhovsky ,  Bas Johannes Petrus Roset ,  Siegfried Alexander Tromp ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/683 ,  G03F7/00

Abstract: A substrate table to support a substrate, the substrate table including a main body, burls extending from the main body and having first upper ends that define a support surface to support the substrate, and support pins having second upper ends. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.