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公开(公告)号：US20240258138A1
公开(公告)日：2024-08-01
申请号：US18423199
申请日：2024-01-25
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gerard GOSEN , Te-Yu CHEN , Dennis Herman, Caspar VAN BANNING , Edwin Cornelis KADIJK , Martijn Petrus, Christianus VAN HEUMEN , Erheng WANG , Johannes Andreas, Henricus, Maria JACOBS
CPC classification number: H01L21/67201 , G03F7/70841 , G03F7/70858 , H01L21/67098
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
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公开(公告)号：US20210173294A1
公开(公告)日：2021-06-10
申请号：US17119331
申请日：2020-12-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf KEMPER , Sjoerd Nicolaas Lambertus DONDERS , Joost Jeroen OTTENS , Edwin Cornelis KADIJK , Sergei SHULEPOV
Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
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Patent Agency Ranking
公开(公告)号：US20210272829A1
公开(公告)日：2021-09-02
申请号：US17257900
申请日：2019-06-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Patriek Adrianus Alphonsus Maria BRUURS , Dennis Herman Caspar VAN BANNING , Jan-Gerard Cornelis VAN DER TOORN , Edwin Cornelis KADIJK
IPC: H01L21/67 , H01J37/244 , H01J37/20 , H01L21/68 , G01K11/125 , G01K1/14
Abstract: A stage apparatus including: an object table configured to hold an object; a positioning device configured to position the object table and the object held by the object table; and a remote temperature sensor configured to measure a temperature of the object table and/or the object, wherein the remote temperature sensor comprises a passive temperature sensing element.
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公开(公告)号：US20200027763A1
公开(公告)日：2020-01-23
申请号：US16514843
申请日：2019-07-17
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gerard GOSEN , Te-Yu CHEN , Dennis Herman, Caspar VAN BANNING , Edwin Cornelis KADIJK , Martijn Petrus, Christianus VAN HEUMEN , Erheng WANG , Johannes Andreas, Henricus, Maria JACOBS
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
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公开(公告)号：US20230127070A1
公开(公告)日：2023-04-27
申请号：US18087320
申请日：2022-12-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf KEMPER , Sjoerd Nicolaas Lambertus DONDERS , Joost Jeroen OTTENS , Edwin Cornelis KADIJK , Sergei SHULEPOV
Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
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公开(公告)号：US20220415678A1
公开(公告)日：2022-12-29
申请号：US17811047
申请日：2022-07-06
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gerard GOSEN , Te-Yu CHEN , Dennis Herman, Caspar VAN BANNING , Edwin Cornelis KADIJK , Martijn Petrus, Christianus VAN HEUMEN , Erheng WANG , Johannes Andreas, Henricus, Maria JACOBS
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
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公开(公告)号：US20180196361A1
公开(公告)日：2018-07-12
申请号：US15742168
申请日：2016-06-14
Applicant: ASML Netherlands B.V.
Inventor： Franciscus Johannes Joseph JANSSEN , Johannes Paul Marie DE LA ROSETTE , Edwin Cornelis KADIJK , Nicolas Alban LALLEMANT , Jan LIEFOOGHE , Markus Rolf Werner MATTHES , Marcel Johannus Elisabeth MUITJENS , Hubert Matthieu Richard STEIJNS , André Gillis VAN DE VELDE , Marinus Aart VAN DEN BRINK
CPC classification number: G03F7/70891 , F28C1/08 , G03F7/70025 , G03F7/70033 , G03F7/708 , G03F7/70858 , H01S3/036 , H01S3/038 , H01S3/0407 , H01S3/041 , H01S3/2232 , H01S3/2308 , H05G2/008
Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.
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