公开(公告)号：US20210173315A1

公开(公告)日：2021-06-10

申请号：US16629337

申请日：2018-07-18

申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

发明人： Yang-Shan HUANG ,  Marcel Joseph Louis BOONEN ,  Han-Kwang NIENHUYS ,  Jacob BRINKERT ,  Richard Joseph BRULS ,  Peter Conrad KOCHERSPERGER

IPC分类号： G03F7/20

摘要： A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.

公开(公告)号：US20200057394A1

公开(公告)日：2020-02-20

申请号：US16587483

申请日：2019-09-30

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： Matthias KRUIZINGA ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Erik Willem BOGAART ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Richard Joseph BRULS ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Mohammad Reza KAMALI ,  Ronald Harm Gunther KRAMER ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Matthew LIPSON ,  Erik Roelof LOOPSTRA ,  Joseph H. LYONS ,  Stephen ROUX ,  Gerrit VAN DEN BOSCH ,  Sander VAN DEN HEIJKANT ,  Sandra VAN DER GRAAF ,  Frits VAN DER MEULEN ,  Jérôme François SylvainVirgile VAN LOO ,  Beatrijs Louis Marie-Joseph Katrien VERBRUGGE

IPC分类号： G03F7/20 ,  G03F1/64 ,  G03F1/22

摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US20230063156A1

公开(公告)日：2023-03-02

申请号：US17794897

申请日：2020-12-24

申请人： ASML Holding N.V. ,  ASML Netherlands B.V.

发明人： Ronald Peter ALBRIGHT ,  Kursat BAL ,  Vadim Yevgenyevich BANINE ,  Richard Joseph BRULS ,  Sjoerd Frans DE VRIES ,  Olav Waldemar Vladimir FRIJNS ,  Yang-Shan HUANG ,  Zhuangxiong HUANG ,  Johannes Henricus Wilhelmus JACOBS ,  Johannes Hubertus Josephina MOORS ,  Georgi Nanchev NENCHEV ,  Andrey NIKIPELOV ,  Thomas Maarten RAASVELD ,  Manish RANJAN ,  Edwin TE SLIGTE ,  Karl Robert UMSTADTER ,  Eray UZGÖREN ,  Marcus Adrianus VAN DE KERKHOF ,  Parham YAGHOOBI

IPC分类号： G03F7/20

摘要： An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

公开(公告)号：US20210041795A1

公开(公告)日：2021-02-11

申请号：US16967794

申请日：2019-02-04

申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V,

发明人： Richard Joseph BRULS ,  Ronald Peter ALBRIGHT ,  Peter Conrad KOCHERSPERGER ,  Victor Antonio PEREZ-FALCON

IPC分类号： G03F7/20 ,  B08B6/00

摘要： Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.

公开(公告)号：US20170363969A1

公开(公告)日：2017-12-21

申请号：US15527645

申请日：2015-09-21

申请人： ASML NETHERLANDS B.V.

发明人： Marc HAUPTMANN ,  Dylan John David DAVIES ,  Paul JANSSEN ,  Naoko TSUGAMA ,  Richard Joseph BRULS ,  Kornelis Tijmen HOEKERD ,  Edwin Johannes Maria JANSSEN ,  Petrus Johannes VAN DEN OEVER ,  Ronald VAN DER WILK ,  Antonius Hubertus VAN SCHIJNDEL ,  Jorge Alberto VIEYRA SALAS

IPC分类号： G03F7/20 ,  G01N27/61

CPC分类号： G03F7/70616 ,  G01N21/9501 ,  G01N27/61 ,  G01N2021/95676 ,  G03F1/84 ,  G03F7/70508 ,  G03F7/70783 ,  H01L22/12 ,  H01L22/20

摘要： A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.

公开(公告)号：US20160209753A1

公开(公告)日：2016-07-21

申请号：US15024815

申请日：2014-09-18

申请人： ASML NETHERLANDS B.V.

发明人： Chuangxin ZHAO ,  Pär Mårten Lukas BROMAN ,  Richard Joseph BRULS ,  Cristian Bogdan CRAUS ,  Jan GROENEWOLD ,  Dzmitry LABETSKI ,  Kerim NADIR ,  Hendrikus Gijsbertsu SCHIMMEL ,  Christian Felix WäHLISCH

IPC分类号： G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70033 ,  G03F7/70058 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/005

摘要： A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.

摘要翻译： 用于光刻设备，特别是激光产生的等离子体源的辐射源包括风扇单元，其围绕但不阻碍收集的辐射束，其被操作以产生远离光轴的缓冲气体中的流。 风扇单元可以包括大致平行于光轴并被驱动以围绕光轴旋转的多个平面或弯曲的叶片。

公开(公告)号：US20190324374A1

公开(公告)日：2019-10-24

申请号：US16460159

申请日：2019-07-02

申请人： ASML NETHERLANDS B.V.

发明人： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Richard Joseph BRULS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Ronald Walther Jeanne SEVERIJNS ,  Sergei SHULEPOV ,  Herman BOOM ,  Timotheus Franciscus SENGERS

IPC分类号： G03F7/20

摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

公开(公告)号：US20180329314A1

公开(公告)日：2018-11-15

申请号：US15526654

申请日：2015-11-16

申请人： ASML NETHERLANDS B.V.

发明人： Matthias KRUIZINGA ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Erik Willem BOGAART ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Richard Joseph BRULS ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Mohammad Reza KAMALI ,  Ronald Harm Gunther KRAMER ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Matthew LIPSON ,  Erik Roelof LOOPSTRA ,  Joseph H. LYONS ,  Stephen ROUX ,  Gerrit VAN DEN BOSCH ,  Sander VAN DEN HEIJKANT ,  Sandra VAN DER GRAAF ,  Frits VAN DER MEULEN ,  Jérôme François Sylvain Virgile VAN LOO ,  Beatrijs Louise Marie-Joseph Katrien VERBRUGGE

IPC分类号： G03F7/20 ,  G03F1/64 ,  G03F1/22

CPC分类号： G03F7/70983 ,  G03F1/22 ,  G03F1/64 ,  G03F7/70825

摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US20170131643A1

公开(公告)日：2017-05-11

申请号：US15029565

申请日：2015-06-03

申请人： ASML Netherlands B.V.

发明人： Paul JANSSEN ,  Richard Joseph BRULS ,  Petrus Jacobus Maria VAN GILS

IPC分类号： G03F7/20

CPC分类号： G03F7/70708 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70866 ,  G03F7/70916 ,  H01L21/6831 ,  H01L21/6875

摘要： A lithographic apparatus includes a first object holder and a second object holder. The first object holder is arranged to hold an object at a holder-facing surface. The object has the holder-facing surface. The second object holder is arranged to hold the object at the holder-facing surface. The lithographic apparatus is arranged to deform a contaminating particle at the holder-facing surface more when the object is held at the second object holder than when the object is held at the first object holder.

公开(公告)号：US20160004171A1

公开(公告)日：2016-01-07

申请号：US14839633

申请日：2015-08-28

申请人： ASML NETHERLANDS B.V.

发明人： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Richard Joseph BRULS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Ronald Walther Jeanne SEVERIJNS ,  Sergei SHULEPOV ,  Herman BOOM ,  Timotheus Franciscus SENGERS

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.