公开(公告)号：US20190243253A1

公开(公告)日：2019-08-08

申请号：US16256359

申请日：2019-01-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Anagnostis TSIATMAS ,  Joannes Jitse Venselaar ,  Samee Ur Rehman ,  Mariya Vyacheslavivna Medvedyeva ,  Bastiaan Onne Fagginger Auer ,  Martijn Maria Zaal ,  Thaleia Kontoroupi

IPC: G03F7/20

CPC classification number: G03F7/70091 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70633 ,  G03F7/70641

Abstract: Methods of optimizing a metrology process are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a first target on a substrate are obtained. Each application of the metrology process includes illuminating the first target with a radiation spot and detecting radiation redirected by the first target. The applications of the metrology process include applications at a) plural positions of the radiation spot relative to the first target, and/or b) plural focus heights of the radiation spot. The measurement data includes, for each application of the metrology process, a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal alignment and/or an optimal focus height based on comparisons between the detected pupil representations in the measurement data and a reference pupil representation.

公开(公告)号：US10585354B2

公开(公告)日：2020-03-10

申请号：US16256359

申请日：2019-01-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Anagnostis Tsiatmas ,  Joannes Jitse Venselaar ,  Samee Ur Rehman ,  Mariya Vyacheslavivna Medvedyeva ,  Bastiaan Onne Fagginger Auer ,  Martijn Maria Zaal ,  Thaleia Kontoroupi

IPC: G03F7/20

Abstract: Methods of optimizing a metrology process are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a first target on a substrate are obtained. Each application of the metrology process includes illuminating the first target with a radiation spot and detecting radiation redirected by the first target. The applications of the metrology process include applications at a) plural positions of the radiation spot relative to the first target, and/or b) plural focus heights of the radiation spot. The measurement data includes, for each application of the metrology process, a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal alignment and/or an optimal focus height based on comparisons between the detected pupil representations in the measurement data and a reference pupil representation.