公开(公告)号：US20160154319A1

公开(公告)日：2016-06-02

申请号：US14906898

申请日：2014-08-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Seyed Iman MOSSAVAT ,  Hugo Augustinus Joseph CRAMER ,  Willem Jan GROOTJANS ,  Adriaan Johan VAN LEEST

IPC: G03F7/20

CPC classification number: G03F7/705 ,  G01N21/956 ,  G01N21/95607 ,  G03F7/70625 ,  G03F9/7092

Abstract: Methods and inspection apparatus and computer program products for assessing a quality of reconstruction of a value of a parameter of interest of a structure, which may be applied for example in metrology of microscopic structures. It is important the reconstruction provides a value of a parameter of interest (e.g. a CD) of the structure which is accurate as the reconstructed value is used to monitor and/or control a lithographic process. This is a way of assessing a quality of reconstruction (803) of a value of a parameter of interest of a structure which does not require the use of a scanning electron microscope, by predicting (804) values of the parameter of interest of structures using reconstructed values of parameters of structures, and by comparing (805) the predicted values of the parameter of interest and the reconstructed values of the parameter of interest.

Abstract translation: 用于评估结构的感兴趣参数的值的重建质量的方法和检查装置和计算机程序产品，其可以应用于例如微观结构的计量学。 重要的是，重建提供了结构的关注参数（例如CD）的值，该值是精确的，因为重建值用于监视和/或控制光刻过程。 这是通过预测（804）结构的感兴趣的参数的值来评估不需要使用扫描电子显微镜的结构的感兴趣参数的值的重建质量（803）的方法， 通过比较（805）感兴趣参数的预测值和感兴趣参数的重建值，重建结构参数值。

公开(公告)号：US20150308966A1

公开(公告)日：2015-10-29

申请号：US14648457

申请日：2013-10-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Willem Jan GROOTJANS ,  Henricus Johannes Lambertu MEGENS ,  Jouke KRIST ,  Miguel GARCIA GRANDA ,  Lu XU

IPC: G01N21/956 ,  G03F7/20 ,  G01N21/47

CPC classification number: G01N21/95607 ,  G01N21/47 ,  G01N2021/4792 ,  G01N2201/06113 ,  G01N2201/12 ,  G03F7/70133 ,  G03F7/70558 ,  G03F7/70625 ,  G03F7/70641

Abstract: Method for determining lithographic quality of a structure produced by a lithographic process using a periodic pattern, such as a grating, detects lithographic process window edges and optimum process conditions. Method steps are: 602: printing a structure using a lithographic process using a grating pattern; 604: selecting a first characteristic, such as a polarization direction, for the illumination; 606: illuminating the structure with incident radiation with first characteristic 608: detecting scattered radiation; 610: selecting a second characteristic, such as a different polarization direction, for the illumination; 612: illuminating the structure with incident radiation with the second characteristic; 614: detecting scattered radiation; 616: rotating one or more angularly resolved spectrum to line up the polarizations, thus correcting for different orientations of the polarizations; 618: determining a difference between the measured angularly resolved spectra; and 620: determining a value of lithographic quality of the structure using the determined difference.

Abstract translation: 用于通过使用诸如光栅的周期性图案的光刻处理产生的结构的光刻质量的方法检测光刻工艺窗口边缘和最佳工艺条件。 方法步骤是：602：使用光栅图案使用光刻工艺印刷结构; 604：为照明选择诸如偏振方向的第一特性; 606：用具有第一特征608的入射辐射照射结构：检测散射辐射; 610：为照明选择诸如不同偏振方向的第二特性; 612：用具有第二特征的入射辐射照射结构; 614：检测散射辐射; 616：旋转一个或多个角度分辨的光谱以对齐偏振，从而校正偏振的不同取向; 618：确定测得的角度分辨光谱之间的差异; 和620：使用确定的差异来确定结构的平版印刷质量的值。