公开(公告)号：US20210072647A1

公开(公告)日：2021-03-11

申请号：US16623647

申请日：2018-05-14

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF ,  Patricius Aloysius Jacobus TINNEMANS ,  Haico Victor KOK ,  William Peter VAN DRENT ,  Sebastianus Adrianus GOORDEN

IPC: G03F7/20

Abstract: The invention relates to a sensor (SE) comprising: —a radiation source (LS) to emit radiation (LI) having a coherence length towards a sensor target (GR); and —a polarizing beam splitter (PBS) to split radiation diffracted by the sensor target into radiation with a first polarization state and radiation with a second polarization state, wherein the first polarization state is orthogonal to the second polarization state, and wherein the sensor is configured such that after passing the polarizing beam splitter radiation with the first polarization state has an optical path difference relative to radiation with the second polarization state that is larger than the coherence length.

公开(公告)号：US20250021026A1

公开(公告)日：2025-01-16

申请号：US18711842

申请日：2022-11-18

Applicant: ASML Netherlands B.V.

Inventor： William Peter VAN DRENT ,  Jan Steven Christiaan WESTERLAKEN ,  Daniel Jozef Maria DIRECKS ,  Johannes Henricus Wilhelmus JACOBS ,  Maurice Wilhelmus Leonardus Hendricus FEIJTS ,  Edwin Johan BUIS ,  Bart Leonardus KNAPEN ,  Nicolaas Johannes Wilhelmus REUVERS ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN

IPC: G03F7/00 ,  H05G2/00

Abstract: The present invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising a first reservoir, a pressurizing system configured to pressurize a hydraulic fluid, and a separating device configured to separate the hydraulic fluid from the liquid target material in the first reservoir and to transfer a pressure from the hydraulic fluid to the liquid target material. The invention also relates to an associated method of supplying liquid target material to a radiation source.

公开(公告)号：US20230091648A1

公开(公告)日：2023-03-23

申请号：US18070155

申请日：2022-11-28

Applicant: ASML Netherlands B.V.

Inventor： Sander Catharina Reinier DERKS ,  Daniel Jozef Maria DIRECKS ,  Maurice Wilhelmus Leonardus Hendricus FEIJTS ,  Pieter Gerardus Mathijs HOEIJMAKERS ,  Katja Cornelia Joanna Clasina MOORS ,  Violeta NAVARRO PAREDES ,  William Peter VAN DRENT ,  Jan Steven Christiaan WESTERLAKEN

IPC: G03F7/20 ,  H05G2/00

Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1 K−1.

公开(公告)号：US20160109812A1

公开(公告)日：2016-04-21

申请号：US14965467

申请日：2015-12-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus VAN DER PASCH ,  Joost Jeroen OTTENS ,  Emiel Jozef Melanie EUSSEN ,  Johannes Henricus Wilhelmus JACOBS ,  William Peter VAN DRENT ,  Frank STAALS ,  Lukasz Jerzy MACHT ,  Erik Willem BOGAART

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

Abstract translation: 一种光刻设备，包括基板台位置测量系统和用于分别测量基板台和投影系统的位置的投影系统位置测量系统。 衬底台位置测量系统包括安装在衬底台上的衬底台参考元件和第一传感器头。 衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。 保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。 投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。 传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。