公开(公告)号：US20190242782A1

公开(公告)日：2019-08-08

申请号：US16253338

申请日：2019-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Mariya Vyacheslavivna MEDVEDYEVA ,  Anagnostis TSIATMAS ,  Hugo Augustinus Joseph CRAMER ,  Martinus Hubertus Maria VAN WEERT ,  Bastiaan Onne FAGGINGER AUER ,  Xiaoxin SHANG ,  Johan Maria VAN BOXMEER ,  Bert VERSTRAETEN

IPC: G01M11/02

CPC classification number: G01M11/0228 ,  G02B7/38 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641

Abstract: Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiation redirected by the target. The applications of the metrology process include applications at different nominal focus heights. The measurement data includes, for each application of the metrology process, at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal focus height for the metrology process using the obtained measurement data.