公开(公告)号：US20190204180A1

公开(公告)日：2019-07-04

申请号：US16214196

申请日：2018-12-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Mariya Vyacheslavivna MEDVEDYEVA ,  Maria Isabel DE LA FUENTE VALENTIN ,  Satej Subhash KHEDEKAR ,  Bert VERSTRAETEN ,  Bastiaan Onne FAGGINGER AUER

IPC: G01M11/02 ,  G01B11/00

CPC classification number: G01M11/02 ,  G01B11/002 ,  G01B2210/56 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633

Abstract: Methods for processing data from a metrology process and for obtaining calibration data are disclosed. In one arrangement, measurement data is obtained from a metrology process. The metrology process includes illuminating a target on a substrate with measurement radiation and detecting radiation redirected by the target. The measurement data includes at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method further includes analyzing the at least a component of the detected pupil representation to determine either or both of a position property and a focus property of a radiation spot of the measurement radiation relative to the target.

公开(公告)号：US20190323972A1

公开(公告)日：2019-10-24

申请号：US16385651

申请日：2019-04-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Samee Ur REHMAN ,  Anagnostis TSIATMAS ,  Sergey TARABRIN ,  Joannes Jitse VENSELAAR ,  Alexandru ONOSE ,  Mariya Vyacheslavivna MEDVEDYEVA

IPC: G01N21/95 ,  G01N21/956

Abstract: Methods of determining a value of a parameter of interest are disclosed. In one arrangement, a symmetric component and an asymmetric component of a detected pupil representation from illuminating a target are derived. A first metric characterizing the symmetric component and a second metric characterizing the asymmetric component vary non-monotonically as a function of the parameter of interest over a reference range of values of the parameter of interest. A combination of the derived symmetric component and the derived asymmetric component are used to identify a correct value from a plurality of candidate values of the parameter of interest.

公开(公告)号：US20190242782A1

公开(公告)日：2019-08-08

申请号：US16253338

申请日：2019-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Mariya Vyacheslavivna MEDVEDYEVA ,  Anagnostis TSIATMAS ,  Hugo Augustinus Joseph CRAMER ,  Martinus Hubertus Maria VAN WEERT ,  Bastiaan Onne FAGGINGER AUER ,  Xiaoxin SHANG ,  Johan Maria VAN BOXMEER ,  Bert VERSTRAETEN

IPC: G01M11/02

CPC classification number: G01M11/0228 ,  G02B7/38 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641

Abstract: Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiation redirected by the target. The applications of the metrology process include applications at different nominal focus heights. The measurement data includes, for each application of the metrology process, at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal focus height for the metrology process using the obtained measurement data.