公开(公告)号：US20190227446A1

公开(公告)日：2019-07-25

申请号：US16315100

申请日：2017-08-14

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Franciscus Godefridus Casper BIJNEN ,  Simon Gijsbert Josephus MATHIJSSEN ,  Vassili DEMERGIS ,  Edo Maria HULSEBOS

IPC: G03F9/00

Abstract: A method of determining the position of an alignment mark on a substrate, the alignment mark having first and second segment, the method including illuminating the alignment mark with radiation, detecting radiation diffracted by the alignment mark and generating a resulting alignment signal. The alignment signal has a first component received during illumination of the first segment only, a second component received during illumination of the second segment only, and a third component received during simultaneous illumination of both segments. The positions of the segments are determined using the first component, the second component and the third component of the alignment signal.

公开(公告)号：US20180329307A1

公开(公告)日：2018-11-15

申请号：US15777162

申请日：2016-11-29

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Ralph BRINKHOF ,  Simon Gijsbert Josephus MATHIJSSEN ,  Maikel Robert GOOSEN ,  Vassili DEMERGIS ,  Bartolokeus Petrus RIJPERS

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70141 ,  G03F9/7046 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

Abstract: A method of measuring a position of an alignment target on a substrate using an optical system. The method includes measuring a sub-segmented target by illuminating the sub-segmented target with radiation and detecting radiation diffracted by the sub-segmented target using a detector system to obtain signals containing positional information of the one sub-segmented target. The sub-segmented target has structures arranged periodically in at least a first direction, at least some of the structures including smaller sub-structures, and each sub-segmented target is formed with a positional offset between the structures and the sub-structures that is a combination of both known and unknown components. The signals, together with information on differences between known offsets of the sub-segmented target are used to calculate a measured position of an alignment target which is corrected for the unknown component of the positional offset.