公开(公告)号：US20200211820A1

公开(公告)日：2020-07-02

申请号：US16730875

申请日：2019-12-30

Applicant: ASML Netherlands B.V.

Inventor： Adam LYONS ,  Thomas I. WALLOW

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/04 ,  G01N23/2251 ,  G01N23/203 ,  G01N23/06

Abstract: A method for scanning a sample by a charged particle beam tool is provided. The method includes providing the sample having a scanning area including a plurality of unit areas, scanning a unit area of the plurality of unit areas, blanking a next unit area of the plurality of unit areas adjacent to the scanned unit area, and performing the scanning and the blanking the plurality of unit areas until all of the unit areas are scanned.

公开(公告)号：US20220084784A1

公开(公告)日：2022-03-17

申请号：US17480032

申请日：2021-09-20

Applicant: ASML Netherlands B.V.

Inventor： Adam LYONS ,  Thomas I. WALLOW

IPC: H01J37/28 ,  G01N23/06 ,  G01N23/203 ,  G01N23/2251 ,  H01J37/04 ,  H01J37/147

Abstract: A method for scanning a sample by a charged particle beam tool is provided. The method includes providing the sample having a scanning area including a plurality of unit areas, scanning a unit area of the plurality of unit areas, blanking a next unit area of the plurality of unit areas adjacent to the scanned unit area, and performing the scanning and the blanking the plurality of unit areas until all of the unit areas are scanned.

公开(公告)号：US20180275521A1

公开(公告)日：2018-09-27

申请号：US15763387

申请日：2016-10-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas I. WALLOW ,  Peng-cheng YANG ,  Adam LYONS ,  Mir Farrokh SHAYEGAN SALEK ,  Hermanus Adrianus DILLEN

IPC: G03F7/20 ,  G03F1/36 ,  G06F17/50

Abstract: A method including providing a plurality of unit cells for a plurality of gauge patterns appearing in one or more images of one or more patterning process substrates, each unit cell representing an instance of a gauge pattern of the plurality of gauge patterns, averaging together image information of each unit cell to arrive at a synthesized representation of the gauge pattern, and determining a geometric dimension of the gauge pattern based on the synthesized representation.