公开(公告)号：US20190377267A1

公开(公告)日：2019-12-12

申请号：US16462742

申请日：2017-11-16

申请人： ASML Netherlands B.V.

发明人： Sumant Sukdew Ramanujan OEMRAWSINGH ,  Arno Jan BLEEKER ,  Alexander Matthijs STRUYCKEN ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Bert Pieter VAN DRIEËNHUIZEN

IPC分类号： G03F7/20 ,  G03F9/00 ,  G02B5/32

摘要： An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.