公开(公告)号：US20160041374A1

公开(公告)日：2016-02-11

申请号：US14780151

申请日：2014-03-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Ivo VANDERHALLEN ,  Alexander Matthijs STRUYCKEN ,  Johannes Christiaan Leonardu FRANKEN

IPC: G02B19/00 ,  G02B7/18 ,  G02B5/09 ,  G02B27/00 ,  G03F7/20 ,  G02B5/10

CPC classification number: G02B19/0023 ,  G02B5/09 ,  G02B5/10 ,  G02B7/1815 ,  G02B19/009 ,  G02B27/0006 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70575 ,  G03F7/70891 ,  G03F7/7095

Abstract: A radiation collector (141) comprising a plurality of reflective surfaces (400-405), wherein each of the plurality of reflective surfaces is coincident with part of one of a plurality of ellipsoids (40-45), wherein the plurality of ellipsoids have in common a first focus (12) and a second focus (16), each of the plurality of reflective surfaces coincident with a different one of the plurality of ellipsoids, wherein the plurality of reflective surfaces are configured to receive radiation originating from the first focus (12) and reflect the radiation to the second focus (16). An apparatus (820) shown in FIG. 11 comprising a cooling system (832) and a reflector (831), wherein the cooling system is configured to cool the reflector, the cooling system comprising: a porous structure (823) situated in thermal contact with the reflector, wherein the porous structure is configured to receive a coolant in a liquid phase state; a condenser (825) configured to receive coolant from (826) the porous structure in a vapour phase state, condense the coolant thereby causing the coolant to undergo a phase change to a liquid phase state and output the condensed coolant in the liquid phase state for entry (827) into the porous structure.

Abstract translation: 一种辐射收集器（141），包括多个反射表面（400-405），其中所述多个反射表面中的每一个与多个椭圆体（40-45）中的一个的一部分重合，其中所述多个椭圆体 共同的第一焦点（12）和第二焦点（16），所述多个反射表面中的每一个与所述多个椭圆体中的不同的一个重合，其中所述多个反射表面被配置为接收源自所述第一焦点的辐射 12）并将辐射反射到第二焦点（16）。 图8所示的装置（820） 11，包括冷却系统（832）和反射器（831），其中所述冷却系统被配置为冷却所述反射器，所述冷却系统包括：与所述反射器热接触的多孔结构（823），其中所述多孔结构 被配置为接收处于液相状态的冷却剂; 冷凝器（825），被配置为以气相状态从（826）多孔结构接收冷却剂，冷凝冷却剂，从而使冷却剂经历相变至液相状态，并输出处于液相状态的冷凝的冷却剂 进入（827）进入多孔结构。

公开(公告)号：US20180031979A1

公开(公告)日：2018-02-01

申请号：US15550855

申请日：2016-01-21

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan BLEEKER ,  Ramon Mark HOFSTRA ,  Erik Petrus BUURMAN ,  Johannes Hubertus Josephina MOORS ,  Alexander Matthijs STRUYCKEN ,  Harm-Jan VOORMA ,  Sumant Sukdew Ramanujan OEMRAWSINGH ,  Markus Franciscus Antonius EURLINGS ,  Peter Frans Maria MUYS

IPC: G03F7/20 ,  H01S3/23 ,  H01S3/00 ,  H05G2/00 ,  G02B27/14

CPC classification number: G03F7/70033 ,  G02B27/141 ,  G03F7/70025 ,  G03F7/70566 ,  H01S3/0064 ,  H01S3/2308 ,  H01S3/2316 ,  H05G2/005 ,  H05G2/008

Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.

公开(公告)号：US20160026091A1

公开(公告)日：2016-01-28

申请号：US14775263

申请日：2014-02-26

Applicant: ASML NETHERLANDS B.V. ,  CARL ZEISS SMT GMBH

Inventor： Erik Roelof LOOPSTRA ,  Olav Waldemar Vladimir FRIJNS ,  Stig BIELING ,  Antonius Theodorus Wilhelmus KEMPEN ,  Ivo VANDERHALLEN ,  Nicolaas TEN KATE ,  Ruud Antonius Catharina Maria BEERENS ,  Richard Henricus Adrianus VAN LIESHOUT ,  Theodorus Petrus Maria CADEE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Alexander Matthijs STRUYCKEN ,  Marcus Petrus SCHEEPERS

IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08 ,  H05G2/00 ,  G02B19/00

CPC classification number: G03F7/70033 ,  G02B5/0891 ,  G02B19/0095 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/067 ,  H05G2/003 ,  H05G2/008

Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.

Abstract translation: 一种辐射收集器，包括第一收集器段，该第一收集器段包括多个掠入射反射器壳体，所述多个入射反射器壳体被配置为引导辐射在离辐射收集器一定距离处的第一位置会聚;第二收集器部分，其包括多个入射入射反射器壳体， 以在距离辐射收集器的所述距离处会聚在第二位置，其中第一位置和第二位置彼此分离。

公开(公告)号：US20250008634A1

公开(公告)日：2025-01-02

申请号：US18718869

申请日：2022-12-21

Applicant: ASML Netherlands B.V.

Inventor： Andrey Sergeevich TYCHKOV ,  Alexander Matthijs STRUYCKEN

IPC: H05G2/00 ,  G02B19/00 ,  G03F7/00

Abstract: An optical system for directing first and second laser pulses along an optical axis to a target to generate extreme ultraviolet radiation from said target. The optical system comprises a first optical component configured to redistribute a first laser pulse to form a shaped laser pulse having a hollow region. The optical system comprise a second optical component configured to focus the shaped laser pulse toward the target. The optical system comprises a third optical component configured to focus a second laser pulse toward the target within the hollow region of the shaped laser pulse. The first, second and third optical components are coaxially arranged on the optical axis.

公开(公告)号：US20190377267A1

公开(公告)日：2019-12-12

申请号：US16462742

申请日：2017-11-16

Applicant: ASML Netherlands B.V.

Inventor： Sumant Sukdew Ramanujan OEMRAWSINGH ,  Arno Jan BLEEKER ,  Alexander Matthijs STRUYCKEN ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Bert Pieter VAN DRIEËNHUIZEN

IPC: G03F7/20 ,  G03F9/00 ,  G02B5/32

Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.