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公开(公告)号：US20230056872A1
公开(公告)日：2023-02-23
申请号：US18048119
申请日：2022-10-20
Applicant: ASML Netherlands B.V.
Inventor： Engelbertus Antonius Fransiscus VAN DER PASCH , Suzanne Johanna Antonetta Geertruda COSIJNS , Koen Govert Olivier VAN DE MEERAKKER , Ivo WIDDERSHOVEN
IPC: G01J9/02 , G01B11/00 , G03F7/00 , G03F7/20 , G01B9/02001 , G01B9/02002 , G01B9/02015
Abstract: The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.
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公开(公告)号：US20210072088A1
公开(公告)日：2021-03-11
申请号：US16965753
申请日：2019-01-15
Applicant: ASML Netherlands B.V.
Inventor： Engelbertus Antonius Fransiscus VAN DER PASCH , Maarten Jozef JANSEN , Suzanne Johanna Antonetta Geertruda COSIJNS , Koen Govert Olivier VAN DE MEERAKKER , Ivo WIDDERSHOVEN
Abstract: The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.
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公开(公告)号：US20250028259A1
公开(公告)日：2025-01-23
申请号：US18908931
申请日：2024-10-08
Applicant: ASML Netherlands B.V.
Inventor： Junichi KANEHARA , Hans BUTLER , Paul Corné Henri DE WIT , Engelbertus Antonius Fransiscus VAN DER PASCH
Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.
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公开(公告)号：US20200234911A1
公开(公告)日：2020-07-23
申请号：US16840297
申请日：2020-04-03
Applicant: ASML Netherlands B.V.
Inventor： Marcel Koenraad Marie BAGGEN , Wouter Onno PRIL , Engelbertus Antonius Fransiscus VAN DER PASCH
IPC: H01J37/20 , H01J37/317 , H01J37/244
Abstract: A stage apparatus for an e-beam inspection apparatus comprising: an object table (3) comprising an supporting surface, the object table configured to support a substrate (190) on the supporting surface; a positioning device (180) configured to a position the object table; a position measurement system (5) comprising a position sensor (8-10) configured to measure a height position of the object table parallel to a first axis, the first axis being substantially perpendicular to the supporting surface, the position sensor comprising an interferometer measurement system having an interferometer sensor (9, 10, 22), wherein a measurement beam (11, 15) of the interferometer sensor is configured to irradiate a reflective surface (13, 17) of the object table in a measurement direction, the measurement direction having a first component parallel to the first axis and a second component parallel to a second axis, the second axis being substantially perpendicular to the first axis.
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公开(公告)号：US20200159126A1
公开(公告)日：2020-05-21
申请号：US16774035
申请日：2020-01-28
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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Patent Agency Ranking
公开(公告)号：US20180017879A1
公开(公告)日：2018-01-18
申请号：US15547713
申请日：2016-01-26
Applicant: ASML Netherlands B.V.
Inventor： Hans BUTLER , Maurice Willem Jozef Etiënne WIJCKMANS , Engelbertus Antonius Fransiscus VAN DER PASCH , Christiaan Alexander HOOGENDAM , Bernardus Antonius Johannes LUTTIKHUIS
IPC: G03F7/20
CPC classification number: G03F7/70833 , G03F7/70725 , G03F7/709
Abstract: A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.
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公开(公告)号：US20240184218A1
公开(公告)日：2024-06-06
申请号：US18441772
申请日：2024-02-14
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY , Arie Jeffrey DEN BOEF , Duygu AKBULUT , Marinus Johannes Maria VAN DAM , Hans BUTLER , Hugo Augustinus Joseph CRAMER , Engelbertus Antonius Fransiscus VAN DER PASCH , Ferry ZIJP , Jeroen Arnoldus Leonardus Johannes RAAYMAKERS , Marinus Petrus REIJNDERS
IPC: G03F7/00 , G01N21/956
CPC classification number: G03F7/70625 , G01N21/956 , G03F7/7015 , G03F7/70633
Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
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公开(公告)号：US20190235398A1
公开(公告)日：2019-08-01
申请号：US16284089
申请日：2019-02-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Jan Steven Christiaan WESTERLAKEN , Gerardus Arnoldus Hendricus Franciscus JANSSEN , Peter Paul STEIJAERT , Engelbertus Antonius Fransiscus VAN DER PASCH , Franciscus VAN DE MAST
IPC: G03F7/20
CPC classification number: G03F7/70916 , G03F7/70341 , G03F7/70608 , G03F7/70683 , G03F7/70775 , G03F7/7085 , G03F7/70908
Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
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公开(公告)号：US20190187566A1
公开(公告)日：2019-06-20
申请号：US16099733
申请日：2017-04-20
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/7085 , G03F7/70633 , G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70808 , G03F9/70 , G03F9/7015 , G03F9/7019 , G03F9/7049 , G03F9/7084 , G03F9/7088
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US20190163072A1
公开(公告)日：2019-05-30
申请号：US16098350
申请日：2017-04-05
Applicant: ASML Netherlands B.V.
Inventor： Carolus Johannes Catharina SCHOORMANS , Johannes Jacobus Matheus BASELMANS , Engelbertus Antonius Fransiscus VAN DER PASCH , Johannes Aidegonda Theodorus Marie VAN DEN HOMBERG , Maksym Yurllovych SLADKOV , Andreas Johannes Antonius BROUNS , Alexander Viktorovych PADIY
CPC classification number: G03F7/70516 , G03F1/42 , G03F7/70725 , G03F7/70775 , G03F7/7085 , G03F9/7019 , G03F9/7088
Abstract: A lithographic method for measuring a position of a target grating with a mask sensor apparatus which comprises a plurality of detector modules each comprising a diffraction grating located at a mask side of a projection system of a lithographic apparatus and an associated detector, the method comprising a first step of measuring first intensities of a combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along a first direction; a second step of displacing the mask sensor apparatus relative to the target grating in a second direction, wherein a size of the relative displacement is proportional to a spatial frequency of a potential error; and a third step of measuring second intensities of the combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along the first direction.
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