公开(公告)号：US20160282723A1

公开(公告)日：2016-09-29

申请号：US15033580

申请日：2014-11-04

申请人： ASML NETHERLANDS B.V.

发明人： Sander Catharina Reinier DERKS ,  Eric Willem Felix CASIMIRI ,  Marcel Mathijs Theodore DIERICHS ,  Sumant Sukdew Ramanujan OEMRAWSINGH ,  Wilhelmus Theodorus Anthonius VAN DEN EINDEN ,  Johannes Fransiscus Maria VELTHUIS ,  Alexander Nikolov ZDRAVKOV ,  Wassim ZEIN EDDINE

IPC分类号： G03F7/20

CPC分类号： G03F7/70033 ,  G02B5/003 ,  G02B5/208 ,  G02B5/22 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70633 ,  G03F7/70875 ,  G03F7/70883 ,  G03F7/70933 ,  H01J5/18 ,  H05G2/001

摘要： An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.

摘要翻译： 一种包括至少一个包括中空部分（41）的密封孔（40）的装置，具有内表面（42），所述内表面在所述装置的不同区域（50; 60）之间的界面处延伸; 以及定位在中空部分中的构件（43），其构造成基本上透射EUV辐射并且基本上过滤所述界面处的非EUV辐射; 其中所述中空部分的内表面具有被配置为增加由所述构件传递到所述中空部分的非EUV辐射的吸收的表面处理。

公开(公告)号：US20180031979A1

公开(公告)日：2018-02-01

申请号：US15550855

申请日：2016-01-21

申请人： ASML Netherlands B.V.

发明人： Arno Jan BLEEKER ,  Ramon Mark HOFSTRA ,  Erik Petrus BUURMAN ,  Johannes Hubertus Josephina MOORS ,  Alexander Matthijs STRUYCKEN ,  Harm-Jan VOORMA ,  Sumant Sukdew Ramanujan OEMRAWSINGH ,  Markus Franciscus Antonius EURLINGS ,  Peter Frans Maria MUYS

IPC分类号： G03F7/20 ,  H01S3/23 ,  H01S3/00 ,  H05G2/00 ,  G02B27/14

CPC分类号： G03F7/70033 ,  G02B27/141 ,  G03F7/70025 ,  G03F7/70566 ,  H01S3/0064 ,  H01S3/2308 ,  H01S3/2316 ,  H05G2/005 ,  H05G2/008

摘要： A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.

公开(公告)号：US20190377267A1

公开(公告)日：2019-12-12

申请号：US16462742

申请日：2017-11-16

申请人： ASML Netherlands B.V.

发明人： Sumant Sukdew Ramanujan OEMRAWSINGH ,  Arno Jan BLEEKER ,  Alexander Matthijs STRUYCKEN ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Bert Pieter VAN DRIEËNHUIZEN

IPC分类号： G03F7/20 ,  G03F9/00 ,  G02B5/32

摘要： An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.