公开(公告)号：US11556067B2

公开(公告)日：2023-01-17

申请号：US17603687

申请日：2020-03-10

申请人： ASML Netherlands B.V.

发明人： Sander Catharina Reinier Derks ,  Daniel Jozef Maria Direcks ,  Maurice Wilhelmus Leonardus Hendricus Feijts ,  Pieter Gerardus Mathijs Hoeijmakers ,  Katja Cornelia Joanna Clasina Moors ,  Violeta Navarro Paredes ,  William Peter Van Drent ,  Jan Steven Christiaan Westerlaken

IPC分类号： G03F7/20 ,  H05G2/00

摘要： A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1K−1.

公开(公告)号：US11143968B2

公开(公告)日：2021-10-12

申请号：US15196120

申请日：2016-06-29

申请人： ASML NETHERLANDS B.V.

发明人： Daniel Jozef Maria Direcks ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Danny Maria Hubertus Philips ,  Michel Riepen ,  Clemens Johannes Gerardus Van Den Dungen ,  Adrianes Johannes Baeten ,  Fabrizio Evangelista

IPC分类号： G03F7/20

摘要： A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

公开(公告)号：US11982947B2

公开(公告)日：2024-05-14

申请号：US18070155

申请日：2022-11-28

申请人： ASML Netherlands B.V.

发明人： Sander Catharina Reinier Derks ,  Daniel Jozef Maria Direcks ,  Maurice Wilhelmus Leonardus Hendricus Feijts ,  Pieter Gerardus Mathijs Hoeijmakers ,  Katja Cornelia Joanna Clasina Moors ,  Violeta Navarro Paredes ,  William Peter Van Drent ,  Jan Steven Christiaan Westerlaken

IPC分类号： G03F7/00 ,  H05G2/00

CPC分类号： G03F7/70916 ,  G03F7/70033 ,  G03F7/70891 ,  H05G2/005 ,  H05G2/008

摘要： A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1 K−1.