公开(公告)号：US20230152717A1

公开(公告)日：2023-05-18

申请号：US17915087

申请日：2021-03-24

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie BAGGEN ,  Jasper Hendrik GRASMAN ,  Chin-Fa TU ,  Lucas KUINDERSMA

IPC: G03F7/20

CPC classification number: G03F7/70833 ,  G03F7/7085 ,  G03F7/70975

Abstract: An interface plate for mounting an apparatus or an assembly of an apparatus to a floor or floor plate is described, the interface plate comprising: an install block having an install surface configured to receive an interface surface of the apparatus or assembly; an adjustment mechanism configured to adjust a position or orientation of the install block relative to the floor or floor plate; and a mounting mechanism configured to rigidly mount the install block to the floor or floor plate.

公开(公告)号：US20240312756A1

公开(公告)日：2024-09-19

申请号：US18674282

申请日：2024-05-24

Applicant: ASML Netherlands B.V.

Inventor： Jasper Hendrik GRASMAN ,  Niels Johannes Maria BOSCH ,  Patrick Peter Hubert Helena PHILIPS ,  Peter Paul HEMPENIUS ,  Joan SANS MERCADER ,  Gerardus Wilhelmus SARS ,  Hans BUTLER ,  Willem Henk URBANUS

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/20235

Abstract: Disclosed herein is a platform for a charged particle apparatus, the platform comprising: a base frame; a chamber arranged to comprise a substrate; a metrology frame arranged to support a charged particle beam generator for irradiating a substrate in the chamber with a charged particle beam; and a bellow arranged between the metrology frame and the chamber; wherein: the chamber is rigidly connected to the base frame; the bellow comprises a flexible material such that the metrology frame is substantially isolated from any vibrations that are generated in the chamber; and the bellow is air tight so that a substantial vacuum may be established in the chamber.

公开(公告)号：US20240071713A1

公开(公告)日：2024-02-29

申请号：US18270707

申请日：2021-12-09

Applicant: ASML Netherlands B.V.

Inventor： Niels Johannes Maria BOSCH ,  Xu WANG ,  Peter Paul HEMPENIUS ,  Yongqiang WANG ,  Hans BUTLER ,  Youjin WANG ,  Jasper Hendrik GRASMAN ,  Jianzi SUI ,  Tianming CHEN ,  Aimin WU

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/20235

Abstract: There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optical axis, and a controller configured for switching between a first operational mode and a second operational mode. The apparatus is configured, when operating in the first operational mode, for irradiating the substrate by the particle beam at a first landing energy of the particle beam and, when operating in the second operational mode, for irradiating the substrate at a second, different landing energy. When operating in the first operational mode, the second positioning device is configured to position the substrate relative to the particle beam generator at a first focus position of the particle beam and in the second operational mode, to position the substrate at a second, different focus position.