-
1.发明公开公开(公告)号：US20240312756A1
公开(公告)日：2024-09-19
申请号：US18674282
申请日：2024-05-24
Applicant: ASML Netherlands B.V.
Inventor： Jasper Hendrik GRASMAN , Niels Johannes Maria BOSCH , Patrick Peter Hubert Helena PHILIPS , Peter Paul HEMPENIUS , Joan SANS MERCADER , Gerardus Wilhelmus SARS , Hans BUTLER , Willem Henk URBANUS
IPC: H01J37/20
CPC classification number: H01J37/20 , H01J2237/20235
Abstract: Disclosed herein is a platform for a charged particle apparatus, the platform comprising: a base frame; a chamber arranged to comprise a substrate; a metrology frame arranged to support a charged particle beam generator for irradiating a substrate in the chamber with a charged particle beam; and a bellow arranged between the metrology frame and the chamber; wherein: the chamber is rigidly connected to the base frame; the bellow comprises a flexible material such that the metrology frame is substantially isolated from any vibrations that are generated in the chamber; and the bellow is air tight so that a substantial vacuum may be established in the chamber.
-
公开(公告)号：US20230386696A1
公开(公告)日：2023-11-30
申请号：US18326935
申请日：2023-05-31
Applicant: ASML Netherlands B.V.
CPC classification number: G21K5/04 , H01J37/3007 , G21K1/02 , H01J37/3177 , H01J37/16 , H01J37/12 , H01J2237/0216 , H01J2237/0262 , H01J2237/1215 , H01J2237/002 , H01J2237/032 , H01J2237/30472 , H01J2237/16 , H01J2237/1825 , H01J2237/0213 , H01J2237/1207 , H01J2237/024
Abstract: The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.
-
公开(公告)号：US20220285124A1
公开(公告)日：2022-09-08
申请号：US17824831
申请日：2022-05-25
Applicant: ASML Netherlands B.V.
IPC: H01J37/153 , H01J37/12 , H01J37/09 , H01J37/065
Abstract: A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking 5 part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.
-
公开(公告)号：US20210383941A1
公开(公告)日：2021-12-09
申请号：US17403849
申请日：2021-08-16
Applicant: ASML Netherlands B.V.
Abstract: The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.
-
-
-
Search Results
4
records
(took 0.012 seconds)
