公开(公告)号：US20190006147A1

公开(公告)日：2019-01-03

申请号：US16064193

申请日：2016-12-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Bernardo KASTRUP ,  Johannes Catharinus Hubertus MULKENS ,  Marinus Aart VAN DEN BRINK ,  Jozef Petrus Henricus BENSCHOP ,  Erwin Paul SMAKMAN ,  Tamara DRUZHININA ,  Coen Adrianus VERSCHUREN

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/15 ,  H01J37/244

Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.

公开(公告)号：US20170205704A1

公开(公告)日：2017-07-20

申请号：US15320749

申请日：2015-07-02

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Vadim Yevgenyevich BANINE ,  Jozef Petrus Henricus BENSCHOP ,  Arjen BOOGAARD ,  Florian Didier Albin DHALLUIN ,  Alexey Sergeevich KUZNETSOV ,  Mária PÉTER ,  Luigi SCACCABAROZZI ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Andrei Mikhailovich YAKUNIN

IPC: G03F1/62 ,  G02B5/20 ,  G03F1/38 ,  G02B5/18 ,  G03F1/24 ,  G03F7/20

CPC classification number: G03F1/62 ,  G02B5/1838 ,  G02B5/208 ,  G03F1/24 ,  G03F1/38 ,  G03F7/70191 ,  G03F7/70316 ,  G03F7/70575 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983

Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.

公开(公告)号：US20210375581A1

公开(公告)日：2021-12-02

申请号：US17403006

申请日：2021-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Bernardo KASTRUP ,  Johannes Catharinus Hubertus MULKENS ,  Marinus Aart VAN DEN BRINK ,  Jozef Petrus Henricus BENSCHOP ,  Erwin Paul SMAKMAN ,  Tamara DRUZHININA ,  Coen Adrianus VERSCHUREN

IPC: H01J37/26 ,  H01J37/15 ,  H01J37/02 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.

公开(公告)号：US20190146332A1

公开(公告)日：2019-05-16

申请号：US16247179

申请日：2019-01-14

Applicant: ASML Netherlands B.V.

Inventor： Pieter-Jan VAN ZWOL ,  Vadim Yevgenyevich BANINE ,  Jozef Petrus Henricus BENSCHOP ,  Florian Didier Albin DHALLUIN ,  Mária PÉTER ,  Luigi SCACCABAROZZI ,  Willem Joan VAN DER ZANDE

IPC: G03F1/62 ,  G03F1/38 ,  G03F1/24 ,  G02B5/18 ,  G03F7/20 ,  G02B5/20

Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane has one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are within some or all of the additional layers.