-
1.发明公开公开(公告)号：US20230267711A1
公开(公告)日：2023-08-24
申请号：US18015313
申请日：2021-07-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Scott Anderson MIDDLEBROOKS , Maxim PISARENCO , Markus Gerardus Martinus Maria VAN KRAAIJ , Coen Adrianus VERSCHUREN
IPC: G06V10/774 , G06N3/0464 , G06V10/50
CPC classification number: G06V10/774 , G06N3/0464 , G06V10/50
Abstract: A method and apparatus for selecting patterns from an image such as a design layout. The method includes obtaining an image (e.g., of a target layout) having a plurality of patterns; determining, based on pixel intensities within the image, a metric (e.g., entropy) indicative of an amount of information contained in one or more portions of the image; and selecting, based on the metric, a sub-set of the plurality of patterns from the one or more portions of the image having values of the metric within a specified range. The sub-set of patterns can be provided as training data for training a model associated with a patterning process.
-
公开(公告)号：US20190227442A1
公开(公告)日：2019-07-25
申请号：US16314740
申请日：2017-06-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Erwin Paul SMAKMAN , Coen Adrianus VERSCHUREN
CPC classification number: G03F7/70625 , G03F7/70383 , G03F7/70391 , G03F7/70508 , G03F9/7026
Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including an array of radiation source modules configured to project the modulated radiation onto a respective array of exposure regions on the substrate; and a distributed processing system configured to process projection related data to enable the projection of the desired pattern onto the substrate, the distributed processing system including at least one central processing unit and a plurality of module processing units each associated with a respective radiation source module.
-
公开(公告)号：US20190006147A1
公开(公告)日：2019-01-03
申请号：US16064193
申请日：2016-12-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Bernardo KASTRUP , Johannes Catharinus Hubertus MULKENS , Marinus Aart VAN DEN BRINK , Jozef Petrus Henricus BENSCHOP , Erwin Paul SMAKMAN , Tamara DRUZHININA , Coen Adrianus VERSCHUREN
IPC: H01J37/26 , H01J37/28 , H01J37/15 , H01J37/244
Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.
-
公开(公告)号：US20250067768A1
公开(公告)日：2025-02-27
申请号：US18724551
申请日：2022-12-22
Applicant: ASML Netherlands B.V.
Inventor： Mustafa Ümit ARABUL , Zili ZHOU , Nitesh PANDEY , Coen Adrianus VERSCHUREN , Willem Marie Julia Marcel COENE , Gerard Jan VERBIEST , Peter Gerard STEENEKEN , Martin Pierre ROBIN
Abstract: The disclosure relates to determining information about a target structure formed on a substrate using a lithographic process. In one arrangement, a cantilever probe is provided having a cantilever arm and a probe element. The probe element extends from the cantilever arm towards the target structure. Ultrasonic waves are generated in the cantilever probe. The ultrasonic waves propagate through the probe element into the target structure and reflect back from the target structure into the probe element or into a further probe element extending from the cantilever arm. The reflected ultrasonic waves are detected and used to determine information about the target structure.
-
公开(公告)号：US20240233305A1
公开(公告)日：2024-07-11
申请号：US18415596
申请日：2024-01-17
Applicant: ASML Netherlands B.V.
Inventor： Maxim PISARENCO , Scott Anderson MIDDLEBROOKS , Markus Gerardus Martinus Maria VAN KRAAIJ , Coen Adrianus VERSCHUREN
Abstract: Disclosed herein is a non-transitory computer readable medium that has stored therein a computer program, wherein the computer program comprises code that, when executed by a computer system, instructs the computer system to perform a method for generating synthetic distorted images, the method comprising: obtaining an input set that comprises a plurality of distorted images; determining, using a model, distortion modes of the distorted images in the input set; generating a plurality of different combinations of the distortion modes; generating, for each one of the plurality of combinations of the distortion modes, a synthetic distorted image in dependence on the combination; and including each of the synthetic distorted images in an output set.
-
Patent Agency Ranking
公开(公告)号：US20180373159A1
公开(公告)日：2018-12-27
申请号：US16064366
申请日：2016-12-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Erwin Paul SMAKMAN , Coen Adrianus VERSCHUREN
Abstract: A method and apparatus to provide a plurality of radiation beams modulated according to at least two sub patterns of a pattern using radiation sources, the radiation sources producing radiation beams of at least two spot sizes such that each of the radiation beams having a same spot size of the at least two spot sizes is used to produce one of the at least two sub patterns, project the plurality of beams onto a substrate, and provide relative motion between the substrate and the plurality of radiation sources, in a scanning direction to expose the substrate. A method and apparatus to provide radiation modulated according to a desired pattern using a plurality of rows of two-dimensional arrays of radiation sources, project the modulated radiation onto a substrate using a projection system, and remove fluid from between the projection system and the substrate using one or more fluid removal units.
-
7.发明申请公开(公告)号：US20180220518A1
公开(公告)日：2018-08-02
申请号：US15747499
申请日：2016-08-03
Applicant: ASML Netherlands B.V.
Inventor： Alexey Olegovich POLYAKOV , Richard QUINTANILHA , Vadim Yevgenyevich BANINE , Coen Adrianus VERSCHUREN
CPC classification number: H05G2/00 , G03F1/84 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/7085 , G21K1/06 , H01L22/12
Abstract: A target structure (T) made by lithography or used in lithography is inspected by irradiating the structure at least a first time with EUV radiation (304) generated by inverse Compton scattering. Radiation (308) scattered by the target structure in reflection or transmission is detected (312) and properties of the target structure are calculated by a processor (340) based on the detected scattered radiation. The radiation may have a first wavelength in the EUV range of 0.1 nm to 125 nm. Using the same source and controlling an electron energy, the structure may be irradiated multiple times with different wavelengths within the EUV range, and/or with shorter (x-ray) wavelengths and/or with longer (UV, visible) wavelengths. By rapid switching of electron energy in the inverse Compton scattering source, irradiation at different wavelengths can be performed several times per second.
-
公开(公告)号：US20240369944A1
公开(公告)日：2024-11-07
申请号：US18287166
申请日：2022-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Chrysostomos BATISTAKIS , Maxim PISARENCO , Markus Gerardus Martinus Maria VAN KRAAIJ , Vito Daniele RUTIGLIANI , Scott Anderson MIDDLEBROOKS , Coen Adrianus VERSCHUREN , Niels GEYPEN
Abstract: A method of determining a stochastic metric, the method including: obtaining a trained model having been trained to correlate training optical metrology data to training stochastic metric data, wherein the training optical metrology data includes a plurality of measurement signals relating to distributions of an intensity related parameter across a zero or higher order of diffraction of radiation scattered from a plurality of training structures, and the training stochastic metric data includes stochastic metric values relating to the plurality of training structures, wherein the plurality of training structures have been formed with a variation in one or more dimensions on which the stochastic metric is dependent; obtaining optical metrology data including a distribution of the intensity related parameter across a zero or higher order of diffraction of radiation scattered from a structure; and using the trained model to infer a value of the stochastic metric from the optical metrology data.
-
公开(公告)号：US20230036630A1
公开(公告)日：2023-02-02
申请号：US17963063
申请日：2022-10-10
Applicant: ASML Netherlands B.V.
IPC: G06T7/00
Abstract: A method for determining an optimized weighting of an encoder and decoder network; the method comprising: for each of a plurality of test weightings, performing the following steps with the encoder and decoder operating using the test weighting: (a) encoding, using the encoder, a reference image and a distorted image into a latent space to form an encoding; (b) decoding the encoding, using the decoder, to form a distortion map indicative of a difference between the reference image and a distorted image; (c) spatially transforming the distorted image by the distortion map to obtain an aligned image; (d) comparing the aligned image to the reference image to obtain a similarity metric; and (e) determining a loss function which is at least partially defined by the similarity metric; wherein the optimized weighting is determined to be the test weighting which has an optimized loss function.
-
公开(公告)号：US20220335290A1
公开(公告)日：2022-10-20
申请号：US17639609
申请日：2020-08-12
Applicant: ASML NETHERLANDS B.V.
Abstract: A method for increasing certainty in parameterized model predictions. The method includes clustering dimensional data in a latent space associated with a parameterized model into clusters. Different clusters correspond to different portions of a given input. The method includes predicting, with the parameterized model, an output based on the dimensional data in the latent space. The method includes transforming, with the parameterized model, the dimensional data in the latent space into a recovered version of the given input that corresponds to one or more of the clusters. In some embodiments, the method includes determining which one or more clusters correspond to predicted outputs with higher variance, and making the parameterized model more descriptive by adding to the dimensionality of the latent space, and/or training the parameterized model with more diverse training data associated with one or more determined clusters or parts thereof associated with predicted outputs with the higher variance.
-
-
-
-
-
-
-
-
-
Search Results
18
records
(took 0.021 seconds)
