公开(公告)号：US20190137861A1

公开(公告)日：2019-05-09

申请号：US16300370

申请日：2017-05-30

Applicant: ASML Netherlands B.V.

Inventor： Pieter Cristiaan DE GROOT ,  Gerard Frans Jozef SCHASFOORT ,  Maksym Yuriiovych SLADKOV ,  Manfred Petrus Johannes Maria DIKKERS ,  Jozef Maria FINDERS ,  Pieter-Jan VAN ZWOL ,  Johannes Jacobus Matheus BASELMANS ,  Stefan Michael Bruno BAUMER ,  Laurentius Cornelius DE WINTER ,  Wouter Joep ENGELEN ,  Marcus Adrianus VAN DE KERKHOF ,  Robbert Jan VOOGD

IPC: G03F1/24 ,  G02B5/02 ,  G03F1/42 ,  G03F1/44 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F1/24 ,  G02B5/0278 ,  G02B5/0284 ,  G02B5/22 ,  G02B2005/1804 ,  G03F1/42 ,  G03F1/44 ,  G03F7/706 ,  G03F7/70683 ,  G03F9/7076

Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.

公开(公告)号：US20190324365A1

公开(公告)日：2019-10-24

申请号：US16502674

申请日：2019-07-03

Applicant: ASML Netherlands B.V.

Inventor： Pieter Cristiaan DE GROOT ,  Gerard Frans Jozef SCHASFOORT ,  Maksym Yuriiovych SLADKOV ,  Manfred Petrus Johannes M DIKKERS ,  Jozef Maria FINDERS ,  Pieter-Jan VAN ZWOL ,  Johannes Jacobus Matheus BASELMANS ,  Stefan Michael Bruno BAUMER ,  Laurentius Cornelius DE WINTER ,  Wouter Joep ENGELEN ,  Marcus Adrianus VAN DE KERKHOF ,  Robbert Jan VOOGD

IPC: G03F1/24 ,  G03F7/20 ,  G03F9/00 ,  G02B5/22 ,  G02B5/02 ,  G03F1/42 ,  G03F1/44

Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.