公开(公告)号：US20190324365A1

公开(公告)日：2019-10-24

申请号：US16502674

申请日：2019-07-03

Applicant: ASML Netherlands B.V.

Inventor： Pieter Cristiaan DE GROOT ,  Gerard Frans Jozef SCHASFOORT ,  Maksym Yuriiovych SLADKOV ,  Manfred Petrus Johannes M DIKKERS ,  Jozef Maria FINDERS ,  Pieter-Jan VAN ZWOL ,  Johannes Jacobus Matheus BASELMANS ,  Stefan Michael Bruno BAUMER ,  Laurentius Cornelius DE WINTER ,  Wouter Joep ENGELEN ,  Marcus Adrianus VAN DE KERKHOF ,  Robbert Jan VOOGD

IPC: G03F1/24 ,  G03F7/20 ,  G03F9/00 ,  G02B5/22 ,  G02B5/02 ,  G03F1/42 ,  G03F1/44

Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.

公开(公告)号：US20210382209A1

公开(公告)日：2021-12-09

申请号：US17282559

申请日：2019-09-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Marcus Adrianus VAN DE KERKHOF ,  Pieter-Jan VAN ZWOL ,  Laurentius Cornelius DE WINTER ,  Wouter Joep ENGELEN ,  Alexey Olegovich POLYAKOV

IPC: G02B5/02 ,  G03F7/20

Abstract: A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.

公开(公告)号：US20190137861A1

公开(公告)日：2019-05-09

申请号：US16300370

申请日：2017-05-30

Applicant: ASML Netherlands B.V.

Inventor： Pieter Cristiaan DE GROOT ,  Gerard Frans Jozef SCHASFOORT ,  Maksym Yuriiovych SLADKOV ,  Manfred Petrus Johannes Maria DIKKERS ,  Jozef Maria FINDERS ,  Pieter-Jan VAN ZWOL ,  Johannes Jacobus Matheus BASELMANS ,  Stefan Michael Bruno BAUMER ,  Laurentius Cornelius DE WINTER ,  Wouter Joep ENGELEN ,  Marcus Adrianus VAN DE KERKHOF ,  Robbert Jan VOOGD

IPC: G03F1/24 ,  G02B5/02 ,  G03F1/42 ,  G03F1/44 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F1/24 ,  G02B5/0278 ,  G02B5/0284 ,  G02B5/22 ,  G02B2005/1804 ,  G03F1/42 ,  G03F1/44 ,  G03F7/706 ,  G03F7/70683 ,  G03F9/7076

Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.

公开(公告)号：US20230305407A1

公开(公告)日：2023-09-28

申请号：US18018065

申请日：2021-07-06

Applicant: ASML Netherlands B.V.

Inventor： Fei LIU ,  Jin LIAN ,  Zhuangxiong HUANG ,  Laurentius Cornelius DE WINTER ,  Frank STAALS

IPC: G03F7/20 ,  G01N21/47 ,  G03F7/00

CPC classification number: G03F7/70641 ,  G01N21/4738 ,  G01N21/4788 ,  G03F7/706851

Abstract: Disclosed is a method for focus measurement of a lithographic process. The method comprises receiving a substrate on which a metrology pattern has been printed with a lithographic apparatus with an illumination pupil, illuminating the metrology pattern with a metrology tool to measure a signal based on radiation scattered by the metrology pattern, and determining or monitoring a focus of the lithographic process based on the measured signal. Position of at least part of the metrology pattern is focus dependent. At least part of the metrology pattern has been printed by the lithography apparatus with an angular asymmetric illumination pupil.

公开(公告)号：US20200264522A1

公开(公告)日：2020-08-20

申请号：US16645672

申请日：2018-08-03

Applicant: ASML Netherlands B.V.

Inventor： Laurentius Cornelius DE WINTER ,  Roland Pieter STOLK ,  Frank STAALS ,  Anton Bernhard VAN OOSTEN ,  Paul Christiaan HINNEN ,  Marinus JOCHEMSEN ,  Thomas THEEUWES ,  Eelco VAN SETTEN

IPC: G03F7/20 ,  G21K1/06

Abstract: Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed structures and second printed structures. The first printed structures are printed by illumination having a first non-telecentricity and the second printed structures being printed by illumination having a second non-telecentricity, different to said first non-telecentricity. A focus dependent parameter related to a focus-dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based at least in part on the focus dependent parameter is derived therefrom.

公开(公告)号：US20160033860A1

公开(公告)日：2016-02-04

申请号：US14775249

申请日：2014-03-04

Applicant: ASML NETHERLANDS B.V.

Inventor： James Norman WILEY ,  Juan Diego ARIAS ESPINOZA ,  Derk Servatius Gertruda BROUNS ,  Laurentius Cornelius DE WINTER ,  Florian Didier Albin DHALLUIN ,  Pedro Julian RIZO DIAGO ,  Luigi SCACCABAROZZI

IPC: G03F1/64

CPC classification number: G03F1/64 ,  G03F1/62 ,  G03F7/70908 ,  G03F7/70983

Abstract: The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.

Abstract translation: 本发明涉及用于屏蔽用于EUV光刻的掩模版的装置。 该装置包括防护薄膜组件和至少一个与防护薄膜组件连通的致动器，所述致动器构造成在使用中诱导防护薄膜相对于掩模版的运动。