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公开(公告)号：US20140089870A1
公开(公告)日：2014-03-27
申请号：US13963947
申请日：2013-08-09
Applicant: ASML Netherlands B.V.
Inventor： Everhardus Cornelis MOS , Hubertus Johannes Gertrudus Simons , Peter Ten Berge , Nicole Schoumans , Michael Kubis , Paul Cornelis Hubertus Aben
IPC: G06F17/50
CPC classification number: G06F17/5081 , G03F1/36 , G03F7/70458 , G03F7/70525 , G03F7/70633
Abstract: A method of calculating process corrections for a lithographic tool, and associated apparatuses. The method comprises measuring process defect data on a substrate that has been previously exposed using the lithographic tool; fitting a process signature model to the measured process defect data, so as to obtain a model of the process signature for the lithographic tool; and using the process signature model to calculate the process corrections for the lithographic tool.
Abstract translation: 一种计算光刻工具的处理校正的方法及相关装置。 该方法包括测量使用光刻工具预先暴露的衬底上的工艺缺陷数据; 将过程签名模型拟合到所测量的过程缺陷数据，以获得用于光刻工具的过程签名的模型; 并使用过程签名模型来计算光刻工具的过程校正。
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公开(公告)号：USRE49460E1
公开(公告)日：2023-03-14
申请号：US14637358
申请日：2015-03-03
Applicant: ASML Netherlands B.V.
Inventor： Everhardus Cornelis Mos , Hubertus Johannes Gertrudus Simons , Peter Ten Berge , Nicole Schoumans , Michael Kubis , Paul Cornelis Hubertus Aben
IPC: G06F30/398 , G03F1/36 , G03F7/20
Abstract: A method of calculating process corrections for a lithographic tool, and associated apparatuses. The method comprises measuring process defect data on a substrate that has been previously exposed using the lithographic tool; fitting a process signature model to the measured process defect data, so as to obtain a model of the process signature for the lithographic tool; and using the process signature model to calculate the process corrections for the lithographic tool.
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公开(公告)号：USRE49199E1
公开(公告)日：2022-09-06
申请号：US14629351
申请日：2015-02-23
Applicant: ASML Netherlands B.V.
Inventor： Everhardus Cornelis Mos , Hubertus Johannes Gertrudus Simons , Peter Ten Berge , Nicole Schoumans , Michael Kubis , Paul Cornelis Hubertus Aben
IPC: G06F30/398 , G03F1/36 , G03F7/20
Abstract: A method of calculating process corrections for a lithographic tool, and associated apparatuses. The method comprises measuring process defect data on a substrate that has been previously exposed using the lithographic tool; fitting a process signature model to the measured process defect data, so as to obtain a model of the process signature for the lithographic tool; and using the process signature model to calculate the process corrections for the lithographic tool.
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公开(公告)号：US08887107B2
公开(公告)日：2014-11-11
申请号：US13963947
申请日：2013-08-09
Applicant: ASML Netherlands B.V.
Inventor： Everhardus Cornelis Mos , Hubertus Johannes Gertrudus Simons , Peter Ten Berge , Nicole Schoumans , Michael Kubis , Paul Cornelis Hubertus Aben
CPC classification number: G06F17/5081 , G03F1/36 , G03F7/70458 , G03F7/70525 , G03F7/70633
Abstract: A method of calculating process corrections for a lithographic tool, and associated apparatuses. The method comprises measuring process defect data on a substrate that has been previously exposed using the lithographic tool; fitting a process signature model to the measured process defect data, so as to obtain a model of the process signature for the lithographic tool; and using the process signature model to calculate the process corrections for the lithographic tool.
Abstract translation: 一种计算光刻工具的处理校正的方法及相关装置。 该方法包括测量使用光刻工具预先暴露的衬底上的工艺缺陷数据; 将过程签名模型拟合到所测量的过程缺陷数据，以获得用于光刻工具的过程签名的模型; 并使用过程签名模型来计算光刻工具的过程校正。
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