公开(公告)号：US09983489B2

公开(公告)日：2018-05-29

申请号：US15311548

申请日：2015-04-24

Applicant: ASML Netherlands B.V.

Inventor： Christianus Wilhelmus Johannes Berendsen ,  Marcel Beckers ,  Henricus Jozef Castelijns ,  Hubertus Antonius Geraets ,  Adrianus Hendrik Koevoets ,  Leon Martin Levasier ,  Peter Schaap ,  Bob Streefkerk ,  Siegfried Alexander Tromp

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70033 ,  G03F7/70625 ,  G03F7/70783 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70941

Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.