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公开(公告)号：US09465302B2
公开(公告)日：2016-10-11
申请号：US14704384
申请日：2015-05-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Clemens Johannes Gerardus Van Den Dungen , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
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公开(公告)号：US10209629B2
公开(公告)日：2019-02-19
申请号：US15824686
申请日：2017-11-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC: G03F7/20
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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公开(公告)号：US09715179B2
公开(公告)日：2017-07-25
申请号：US14933956
申请日：2015-11-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Siebe Landheer , Marcel Beckers , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Franciscus Johannes Joseph Janssen
CPC classification number: G03F7/70341 , G03B27/52
Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.
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公开(公告)号：US20170023870A1
公开(公告)日：2017-01-26
申请号：US15287524
申请日：2016-10-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Clemens Johannes Gerardus VAN DEN DUNGEN , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70866
Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
Abstract translation: 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。
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公开(公告)号：US10802410B2
公开(公告)日：2020-10-13
申请号：US15299240
申请日：2016-10-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Marcel Beckers , Stefan Philip Christiaan Belfroid , Ferdy Migchelbrink , Sergei Shulepov
IPC: G03F7/20
Abstract: A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.
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Patent Agency Ranking
公开(公告)号：US09983489B2
公开(公告)日：2018-05-29
申请号：US15311548
申请日：2015-04-24
Applicant: ASML Netherlands B.V.
Inventor： Christianus Wilhelmus Johannes Berendsen , Marcel Beckers , Henricus Jozef Castelijns , Hubertus Antonius Geraets , Adrianus Hendrik Koevoets , Leon Martin Levasier , Peter Schaap , Bob Streefkerk , Siegfried Alexander Tromp
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70033 , G03F7/70625 , G03F7/70783 , G03F7/70875 , G03F7/70891 , G03F7/70941
Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.
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7.发明申请公开(公告)号：US20170192365A1
公开(公告)日：2017-07-06
申请号：US15452445
申请日：2017-03-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf KEMPER , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
CPC classification number: G03F7/70866 , B01D19/0021 , G03B27/52 , G03F7/70341
Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
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公开(公告)号：US10088755B2
公开(公告)日：2018-10-02
申请号：US15627054
申请日：2017-06-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Siebe Landheer , Marcel Beckers , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Franciscus Johannes Joseph Janssen
Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.
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公开(公告)号：US09857695B2
公开(公告)日：2018-01-02
申请号：US15250658
申请日：2016-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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10.发明授权公开(公告)号：US09606429B2
公开(公告)日：2017-03-28
申请号：US14498883
申请日：2014-09-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
CPC classification number: G03F7/70866 , B01D19/0021 , G03B27/52 , G03F7/70341
Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
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