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公开(公告)号：US12033830B2
公开(公告)日：2024-07-09
申请号：US17944157
申请日：2022-09-13
Applicant: ASML Netherlands B.V.
Inventor： Weiming Ren , Xuerang Hu , Qingpo Xi , Xuedong Liu
IPC: H01J37/244 , H01J37/153 , H01J37/28
CPC classification number: H01J37/244 , H01J37/153 , H01J37/28 , H01J2237/0453 , H01J2237/24475 , H01J2237/2448
Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector. The electro-optical system may include a first pre-limit aperture plate comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements, wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.
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公开(公告)号：US11614416B2
公开(公告)日：2023-03-28
申请号：US16655140
申请日：2019-10-16
Applicant: ASML Netherlands B.V.
Inventor： Xuerang Hu , Xinan Luo , Qingpo Xi , Xuedong Liu , Weiming Ren
IPC: G01N23/225 , G01N21/95 , H01J37/244 , H01J37/32
Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.
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Patent Agency Ranking
公开(公告)号：US12165830B2
公开(公告)日：2024-12-10
申请号：US17708517
申请日：2022-03-30
Applicant: ASML Netherlands B.V.
Inventor： Shichen Gu , Weiming Ren , Qingpo Xi
Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system comprising a beam-limit aperture plate having a surface substantially perpendicular to an optical axis, the beam-limit aperture plate comprising a first aperture at a first distance relative to the surface of the beam-limit aperture plate, and a second aperture at a second distance relative to the surface of the beam-limit aperture plate, the second distance being different from the first distance. The first aperture may be a part of a first set of apertures of the beam-limit aperture plate at the first distance, and the second aperture may be a part of a second set of apertures of the beam-limit aperture plate at the second distance.
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公开(公告)号：US11469074B2
公开(公告)日：2022-10-11
申请号：US16886461
申请日：2020-05-28
Applicant: ASML Netherlands B.V.
Inventor： Weiming Ren , Xuerang Hu , Qingpo Xi , Xuedong Liu
IPC: H01J37/244 , H01J37/153 , H01J37/28
Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector. The electro-optical system may include a first pre-limit aperture plate comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements, wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.
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公开(公告)号：US11961698B2
公开(公告)日：2024-04-16
申请号：US17344446
申请日：2021-06-10
Applicant: ASML Netherlands B.V.
Inventor： Christiaan Otten , Peter-Paul Crans , Marc Smits , Laura Del Tin , Christan Teunissen , Yang-Shan Huang , Stijn Wilem Herman Karel Steenbrink , Xuerang Hu , Qingpo Xi , Xinan Luo , Xuedong Liu
IPC: H01J37/15 , H01J37/02 , H01J37/14 , H01J37/147 , H01J37/18 , H01J37/244 , H01J37/28 , H01J37/20 , H01J37/317
CPC classification number: H01J37/15 , H01J37/023 , H01J37/14 , H01J37/1477 , H01J37/18 , H01J37/244 , H01J37/28 , H01J37/20 , H01J37/3177 , H01J2237/2006 , H01J2237/20214 , H01J2237/2817
Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.
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公开(公告)号：US11676792B2
公开(公告)日：2023-06-13
申请号：US16652025
申请日：2018-09-25
Applicant: ASML Netherlands B.V.
Inventor： Xuedong Liu , Qingpo Xi , Youfei Jiang , Weiming Ren , Xuerang Hu , Zhongwei Chen
CPC classification number: H01J37/12 , H01J37/28 , H01J2237/0048
Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.
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公开(公告)号：US12191109B2
公开(公告)日：2025-01-07
申请号：US18144821
申请日：2023-05-08
Applicant: ASML Netherlands B.V.
Inventor： Xuedong Liu , Qingpo Xi , Youfei Jiang , Weiming Ren , Xuerang Hu , Zhongwei Chen
Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.
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