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公开(公告)号：US20220277926A1
公开(公告)日：2022-09-01
申请号：US17753298
申请日：2020-08-25
发明人： Yixiang WANG , Shibing LIU , Shanhui CAO , Kangsheng QIU , Juying DOU , Ying LUO , Yinglong LI , Qiang LI , Ronald VAN DER WILK , Jan-Gerard Cornelis VAN DER TOORN
IPC分类号： H01J37/20 , H01L21/683
摘要： Systems and methods for wafer grounding and wafer grounding location adjustment are disclosed. A first method may include receiving a first value of an electric characteristic associated with the wafer being grounded by an electric signal; determining a first control parameter using at least the first value; and controlling a characteristic of the electric signal using the first control parameter and the first value. A second method for adjusting a grounding location for a wafer may include terminating an electric connection between the wafer and at least one grounding pin in contact the wafer; adjusting a relative position between the wafer and the grounding pin; and restoring the electric connection between the grounding pin and the wafer. A third method may include causing a grounding pin to penetrate through a coating on the wafer by impact; and establishing an electrical connection between the grounding pin and the wafer.
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公开(公告)号：US20210313908A1
公开(公告)日：2021-10-07
申请号：US17351181
申请日：2021-06-17
发明人： Jan-Gerard Cornelis VAN DER TOORN , Jeroen Gertruda Antonius HUINCK , Han Willem Hendrik SEVERT , Allard Eelco KOOIKER , Michaël Johannes Christiaan RONDE , Arno Maria WELLINK , Shibing LIU , Ying LUO , Yixiang WANG , Chia-Yao CHEN , Bohang ZHU , Jurgen VAN SOEST
摘要： Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.
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公开(公告)号：US20230246568A1
公开(公告)日：2023-08-03
申请号：US18132617
申请日：2023-04-10
发明人： Jan-Gerard Cornelis VAN DER TOORN , Jeroen Gertruda Antonius HUINCK , Han Willem Hendrik SEVERT , Allard Eelco KOOIKER , Michael Johannes Christiaan RONDE , Arno Maria WELLINK , Shibing LIU , Ying LUO , Yixiang WANG , Chia-Yao CHEN , Bohang ZHU , Jurgen VAN SOEST
CPC分类号： H02N13/00 , G03F7/70708 , G03F7/70716
摘要： Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.
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4.发明公开公开(公告)号：US20230178406A1
公开(公告)日：2023-06-08
申请号：US17913149
申请日：2021-03-18
发明人： Yixiang WANG , Shibing LIU , Ying LUO
IPC分类号： H01L21/683 , H01J37/20
CPC分类号： H01L21/6833 , H01J37/20 , H01J2237/2817 , H01J2237/24592 , H01J2237/20285
摘要： An electrostatic chuck control system configured to be utilized during an inspection process of a wafer, the electrostatic chuck control system comprising an electrostatic chuck of a stage configured to be undocked during the inspection process, wherein the electrostatic chuck comprises a plurality of components configured to influence an interaction between the wafer and the electrostatic chuck during the inspection process, a first sensor configured to generate measurement data between at least some of the plurality of components and the wafer, and a controller including circuitry configured to receive the measurement data to determine characteristics of the wafer relative to the electrostatic chuck and to generate adjustment data to enable adjusting, while the stage is undocked, at least some of the plurality of components based on the determined characteristics.
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公开(公告)号：US20230114067A1
公开(公告)日：2023-04-13
申请号：US17798061
申请日：2021-02-04
发明人： Long DI , Chenxi FU , Lucas KUINDERSMA , Kuo-Feng TSENG , Peter Paul HEMPENIUS , Yu LIU , Ying LUO
摘要： Apparatuses and systems for damping vibration of a vacuum vessel mounted with a pump include a pump body and a damping element coupled to the pump body, wherein the pump body and the damping element form a mass-based damper, and wherein the pump body forms a mass component of the mass-based damper; and the damping element forms a damping component of the mass-based damper. The apparatuses and systems also include a pump body configured to be secured to a column of a charged-particle inspection apparatus, a sensor coupled to the pump body, an actuator coupled to the pump body, and a circuitry communicatively coupled to the sensor and the actuator for receiving motion data indicative of a vibration of the column; determining a damping based on the motion data; and actuate the actuator to react to the vibration of the column in accordance with the damping.
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公开(公告)号：US20220068590A1
公开(公告)日：2022-03-03
申请号：US17418741
申请日：2019-12-19
发明人： Ying LUO , Zhonghua DONG , Xuehui YIN , Long DI , Nianpei DENG , Wei FANG , Lingling PU , Ruochong FEI , Bohang ZHU , Yu LIU
IPC分类号： H01J37/147 , H01J37/20 , H01J37/21 , H01J37/28
摘要： Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 kHz to 50 kHz, and 50 kHz to 200 kHz, respectively.
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