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公开(公告)号：US20220277926A1
公开(公告)日：2022-09-01
申请号：US17753298
申请日：2020-08-25
发明人： Yixiang WANG , Shibing LIU , Shanhui CAO , Kangsheng QIU , Juying DOU , Ying LUO , Yinglong LI , Qiang LI , Ronald VAN DER WILK , Jan-Gerard Cornelis VAN DER TOORN
IPC分类号： H01J37/20 , H01L21/683
摘要： Systems and methods for wafer grounding and wafer grounding location adjustment are disclosed. A first method may include receiving a first value of an electric characteristic associated with the wafer being grounded by an electric signal; determining a first control parameter using at least the first value; and controlling a characteristic of the electric signal using the first control parameter and the first value. A second method for adjusting a grounding location for a wafer may include terminating an electric connection between the wafer and at least one grounding pin in contact the wafer; adjusting a relative position between the wafer and the grounding pin; and restoring the electric connection between the grounding pin and the wafer. A third method may include causing a grounding pin to penetrate through a coating on the wafer by impact; and establishing an electrical connection between the grounding pin and the wafer.
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公开(公告)号：US20160026085A1
公开(公告)日：2016-01-28
申请号：US14871795
申请日：2015-09-30
发明人： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Hans JANSEN , Martinus Hendikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Jeroen Johannes Sophia Maria MERTENS , Jan-Gerard Cornelis VAN DER TOORN , Michel RIEPEN
IPC分类号： G03F7/20
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
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公开(公告)号：US20140375973A1
公开(公告)日：2014-12-25
申请号：US14484076
申请日：2014-09-11
发明人： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Jeroen Johannes Sophia Maria MERTENS , Jan-Gerard Cornelis VAN DER TOORN , Michel RIEPEN
IPC分类号： G03F7/20
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。
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公开(公告)号：US20210272829A1
公开(公告)日：2021-09-02
申请号：US17257900
申请日：2019-06-27
发明人： Patriek Adrianus Alphonsus Maria BRUURS , Dennis Herman Caspar VAN BANNING , Jan-Gerard Cornelis VAN DER TOORN , Edwin Cornelis KADIJK
IPC分类号： H01L21/67 , H01J37/244 , H01J37/20 , H01L21/68 , G01K11/125 , G01K1/14
摘要： A stage apparatus including: an object table configured to hold an object; a positioning device configured to position the object table and the object held by the object table; and a remote temperature sensor configured to measure a temperature of the object table and/or the object, wherein the remote temperature sensor comprises a passive temperature sensing element.
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公开(公告)号：US20180046089A1
公开(公告)日：2018-02-15
申请号：US15790287
申请日：2017-10-23
发明人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Henrikus Herman Marie COX , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Joeri LOF , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEDLEN , Johannes Catharinus Hubertus MULKENS , Gerardus Petrus Matthijs VAN NUNEN , Klaus SIMON , Bernardus Antonius SLAGHEKKE , Alexander STRAAIJER , Jan-Gerard Cornelis VAN DER TOORN , Martijn HOUKES
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US20170031250A1
公开(公告)日：2017-02-02
申请号：US15293009
申请日：2016-10-13
发明人： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Stefan Philip Christiaan BELFROID , Johannes Petrus Maria SMEULERS , Herman VOGEL
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号：US20230360879A1
公开(公告)日：2023-11-09
申请号：US18196296
申请日：2023-05-11
CPC分类号： H01J37/20 , H02G11/00 , H01J2237/0262 , H01J2237/2007
摘要： The present disclosure relates to a stage apparatus comprising: an object table configured to hold a substrate, the object table comprising an electrode configured to be charged by a power source and an electrical connection configured to electrically connect the electrode to the power source, and an electric field shield configured to shield at least a part of the electrical connection.
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公开(公告)号：US20210313908A1
公开(公告)日：2021-10-07
申请号：US17351181
申请日：2021-06-17
发明人： Jan-Gerard Cornelis VAN DER TOORN , Jeroen Gertruda Antonius HUINCK , Han Willem Hendrik SEVERT , Allard Eelco KOOIKER , Michaël Johannes Christiaan RONDE , Arno Maria WELLINK , Shibing LIU , Ying LUO , Yixiang WANG , Chia-Yao CHEN , Bohang ZHU , Jurgen VAN SOEST
摘要： Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.
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公开(公告)号：US20220028648A1
公开(公告)日：2022-01-27
申请号：US17497761
申请日：2021-10-08
发明人： Han Willem Hendrik SEVERT , Jan-Gerard Cornelis VAN DER TOORN , Ronald VAN DER WILK , Allard Eelco KOOIKER
摘要： A stage apparatus for a particle-beam apparatus is disclosed. A particle beam apparatus may comprise a conductive object and an object table, the object table being configured to support an object. The object table comprises a table body and a conductive coating, the conductive coating being provided on at least a portion of a surface of the table body. The conductive object is disposed proximate to the conductive coating and the table body is provided with a feature proximate to an edge portion of the conductive coating. Said feature is arranged so as to reduce an electric field strength in the vicinity of the edge portion of the conductive coating when a voltage is applied to both the conductive object and the conductive coating.
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公开(公告)号：US20170212422A1
公开(公告)日：2017-07-27
申请号：US15482587
申请日：2017-04-07
发明人： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Jeroen Johannes Sophia Maria MERTENS , Jan-Gerard Cornelis VAN DER TOORN , Michel RIEPEN
IPC分类号： G03F7/20 , H01L21/67 , G03F7/30 , H01L21/027
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
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