公开(公告)号：US20160230019A1

公开(公告)日：2016-08-11

申请号：US14619603

申请日：2015-02-11

申请人： AZ Electronic Materials (Luxembourg) S.a.r.L

发明人： Huirong YAO ,  Elizabeth WOLFER ,  Salem K. MULLEN ,  Alberto D. DIOSES ,  JoonYeon CHO

IPC分类号： C09D5/00 ,  G03F7/11 ,  H01L21/02 ,  H01L21/308 ,  H01L21/311

CPC分类号： C09D5/006 ,  G03F7/11 ,  H01L21/02142 ,  H01L21/02172 ,  H01L21/02175 ,  H01L21/02282 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/31133 ,  H01L21/31138

摘要： The present invention relates to a novel composition with improved stability containing soluble, multi-ligand-substituted metal compound, a polyol compound and a solvent useful for filling material on photoresist patterns with good trench or via filling properties of microlithographic features, where the filled patterns having good plasma etch resistance in oxygen based plasmas and are used as a hard mask in forming fine patterns on semiconductor substrates by pattern transfer of this hard mask. The present invention further relates to using the novel composition in methods for manufacturing electronic devices.

摘要翻译： 本发明涉及具有改进稳定性的新型组合物，其含有可溶性，多配位体取代的金属化合物，多元醇化合物和可用于在光刻胶图案上填充材料的溶剂，具有良好的沟槽或通过微光刻特征的通孔填充特性，其中填充图案 在氧基等离子体中具有良好的等离子体蚀刻电阻，并且用作通过该硬掩模的图案转印在半导体衬底上形成精细图案的硬掩模。 本发明还涉及在制造电子器件的方法中使用该组合物。

公开(公告)号：US20150200091A1

公开(公告)日：2015-07-16

申请号：US14445757

申请日：2014-07-29

申请人： AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.

发明人： Venkata Gopal Reddy CHADA ,  Huirong YAO ,  Munirathna PADMANABAN ,  JoonYeon CHO ,  Elizabeth WOLFER ,  Alberto D. DIOSES ,  Salem K. MULLEN

IPC分类号： H01L21/02 ,  H01L21/311 ,  H01L21/477 ,  H01L21/47

CPC分类号： H01L21/02172 ,  G03F7/0042 ,  G03F7/091 ,  G03F7/094 ,  H01L21/02142 ,  H01L21/02282 ,  H01L21/31133 ,  H01L21/47 ,  H01L21/477

摘要： The present invention relates to novel compositions comprising a metal component selected from a group chosen from at least one polyoxometalate, at least one heteropolyoxometalate and a mixture thereof; and, at least one organic component. The present invention also relates to methods of preparing the nanorod arrays and the nanorod materials and films. The present invention also relates to novel compositions to generate metal-oxide rich films, and also relates to processes for via or trench filling, reverse via or trench filling and imaging with underlayers. The materials are useful in wide range of manufacturing applications in many industries, including the semiconductor devices, electro-optical devices and energy storage industry.

摘要翻译： 本发明涉及包含选自至少一种多金属氧酸盐，至少一种杂多金属氧酸盐及其混合物的金属组分的新型组合物; 和至少一种有机组分。 本发明还涉及制备纳米棒阵列和纳米棒材料和薄膜的方法。 本发明还涉及产生富金属氧化物膜的新型组合物，还涉及用于通孔或沟槽填充，反向通孔或沟槽填充和用底层成像的方法。 这些材料在许多行业的广泛的制造应用中是有用的，包括半导体器件，电光器件和储能行业。

公开(公告)号：US20150200090A1

公开(公告)日：2015-07-16

申请号：US14154929

申请日：2014-01-14

申请人： AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.

发明人： Venkata Gopal Reddy CHADA ,  Huirong YAO ,  Salem MULLEN ,  Elizabeth WOLFER ,  Alberto D. DIOSES ,  JoonYeon CHO ,  Munirathna PADMANABAN

IPC分类号： H01L21/02 ,  H01L21/311

CPC分类号： C01G41/00 ,  C01G31/00 ,  C01G39/00 ,  G03F7/0047 ,  H01L21/0332

摘要： The present invention relates to a novel spin coatable composition comprising (a) metallosilicic acid; (b) at least one compound comprising two or more 4-hydroxyphenyl groups; and, c) a solvent. The component b) can be a 4-hydroxyphenyl compound of structure (I) wherein W is a linking group chosen from the group consisting of an organic linking moiety, a heteroatom containing linking moiety and a direct valence bond, m is a positive integer of 1 and n is a positive integer equal to 1 or and Ri, Rii, Riii and Riv are independently chosen substituents from a group consisting of hydrogen, (C1-C6) alkyl, (C1-C6) alkoxy, (C6-C20) aryl, halides (such as Cl, I, F), hydroxyl, alkylcarbonyl (alkyl-C(═O)—), alkylcarbonyloxy (alkyl-C(═O)—O—), alkyloxycarbonyl (alkyl-O—C(═O)—), alkyloxycarbonyloxy (alkyl-O—C(═O)—O—) and mixtures of these; and a solvent. The present invention further relates to processes using the novel compositions.

摘要翻译： 本发明涉及一种新颖的可旋涂组合物，其包含（a）金属硅酸; （b）至少一种包含两个或多个4-羟基苯基的化合物; 和c）溶剂。 组分b）可以是结构（I）的4-羟基苯基化合物，其中W是选自有机连接部分，含杂原子的连接部分和直接键键的连接基团，m是 1和n是等于1的正整数，或者R 1，R 11，R 13i和R e独立地选自氢，（C 1 -C 6）烷基，（C 1 -C 6）烷氧基，（C 6 -C 20）芳基 ，卤化物（如Cl，I，F），羟基，烷基羰基（烷基-C（= O） - ），烷基羰基氧基（烷基-C（= O）-O-），烷氧基羰基（烷基-O-C（= ） - ），烷氧基羰基氧基（烷基-O-C（= O）-O-）及其混合物; 和溶剂。 本发明还涉及使用该新型组合物的方法。