Abrasion Resistant Coatings by Plasma Enhanced Chemical Vapor Diposition
    1.
    发明申请
    Abrasion Resistant Coatings by Plasma Enhanced Chemical Vapor Diposition 审中-公开
    通过等离子体增强化学气相沉积的耐磨涂层

    公开(公告)号:US20070264508A1

    公开(公告)日:2007-11-15

    申请号:US11663799

    申请日:2005-10-06

    IPC分类号: B32B9/04 C08J7/00 C23C16/50

    摘要: A process for preparing a multiple layer coating on the surface of an organic polymeric substrate by means of atmospheric pressure glow discharge deposition, the steps of the process comprising depositing a layer (first layer) of a plasma polymerized, optically clear, organosilicon compound and thereafter in a second step depositing a substantially uniform layer (second layer) of a polymeric siloxane or silicon oxide compound onto the exposed surface of said first layer, wherein the multiple layer coating has a thickness of at least 2.0 μm and an abrasion resistance demonstrating a change of 20 delta haze units or less after 500 Tabor cycles, measured according to ASTM D1044, CS10F wheels, 500 g weight.

    摘要翻译: 一种通过大气压辉光放电沉积在有机聚合物基材的表面上制备多层涂层的方法,该方法的步骤包括沉积等离子体聚合的,光学透明的有机硅化合物的层(第一层),此后 在第二步骤中,将聚合物硅氧烷或氧化硅化合物的基本上均匀的层(第二层)沉积到所述第一层的暴露表面上,其中所述多层涂层具有至少2.0μm的厚度和显示出改变的耐磨性 在500 Tabor循环后,根据ASTM D1044,CS10F轮,500g重量测量的20个三角洲雾度单位或更小。