公开(公告)号：US12036510B2

公开(公告)日：2024-07-16

申请号：US17717690

申请日：2022-04-11

申请人： Akemi Sato ,  Takeshi Hirabayashi ,  Koji Sugiura ,  Keisuke Murawaki ,  Takaya Ota ,  Masatoshi Ikebe ,  Kohei Takasaki ,  Takeshi Morishima

发明人： Akemi Sato ,  Takeshi Hirabayashi ,  Koji Sugiura ,  Keisuke Murawaki ,  Takaya Ota ,  Masatoshi Ikebe ,  Kohei Takasaki ,  Takeshi Morishima

IPC分类号： B01D53/94

CPC分类号： B01D53/94 ,  B01D2255/1021 ,  B01D2255/1025 ,  B01D2255/2042 ,  B01D2255/2065 ,  B01D2255/20715 ,  B01D2255/407 ,  B01D2255/9155 ,  F01N2330/60 ,  F01N2510/0682

摘要： An exhaust gas purification device suppresses a pressure loss increase and includes a honeycomb substrate and inflow cell side catalyst layer. The substrate includes a porous partition wall defining several cells extending from an inflow side end surface to an outflow side end surface. The cells include an inflow and outflow cell adjacent across the wall. The inflow cell has an open inflow side end and sealed outflow side end. The outflow cell has a sealed inflow side end and open outflow side end. The catalyst layer is on an inflow cell side surface in an region extending from the inflow side end positioned 10% or more of the partition wall length. At this position, a filled portion of the inflow cell side catalyst layer pores are 40% or less. The pores are present to a depth of 50% of a thickness of the partition wall.

公开(公告)号：US11918986B2

公开(公告)日：2024-03-05

申请号：US17752495

申请日：2022-05-24

申请人： Koji Sugiura ,  Takeshi Hirabayashi ,  Akemi Satou ,  Keisuke Murawaki ,  Takaya Ota ,  Masatoshi Ikebe ,  Kohei Takasaki ,  Takeshi Morishima

发明人： Koji Sugiura ,  Takeshi Hirabayashi ,  Akemi Satou ,  Keisuke Murawaki ,  Takaya Ota ,  Masatoshi Ikebe ,  Kohei Takasaki ,  Takeshi Morishima

IPC分类号： B01J35/00 ,  B01D53/94 ,  B01J21/04 ,  B01J21/06 ,  B01J23/10 ,  B01J23/42 ,  B01J23/46 ,  B01J35/04 ,  F01N3/28

CPC分类号： B01J35/0006 ,  B01D53/9472 ,  B01J21/04 ,  B01J21/066 ,  B01J23/10 ,  B01J23/42 ,  B01J23/464 ,  B01J35/04 ,  F01N3/2803 ,  F01N3/2842 ,  B01D2255/1021 ,  B01D2255/1025 ,  B01D2255/2065 ,  B01D2255/9035 ,  B01D2255/9155 ,  F01N2370/02

摘要： There is provided an exhaust gas purification device that shows a high HC removal performance under a condition in which a rich air-fuel mixture is introduced. The exhaust gas purification device includes a substrate, a first catalyst layer, and a second catalyst layer. The substrate includes an upstream end and a downstream end. The first catalyst layer is disposed on a surface of the partition wall in an upstream region including the upstream end of the substrate. The second catalyst layer is disposed inside the partition wall in a downstream region including the downstream end of the substrate. The first catalyst layer contains a first metal catalyst and alumina-zirconia composite oxide. The second catalyst layer contains a second metal catalyst.

公开(公告)号：US11679379B2

公开(公告)日：2023-06-20

申请号：US17734702

申请日：2022-05-02

申请人： Koji Sugiura ,  Takeshi Hirabayashi ,  Akemi Satou ,  Keisuke Murawaki ,  Takaya Ota ,  Masatoshi Ikebe ,  Kohei Takasaki ,  Takeshi Morishima

发明人： Koji Sugiura ,  Takeshi Hirabayashi ,  Akemi Satou ,  Keisuke Murawaki ,  Takaya Ota ,  Masatoshi Ikebe ,  Kohei Takasaki ,  Takeshi Morishima

IPC分类号： B01J35/00 ,  B01J35/04 ,  F01N3/28 ,  B01D53/94

CPC分类号： B01J35/0006 ,  B01D53/94 ,  B01J35/04 ,  F01N3/2828 ,  B01D2255/1021 ,  B01D2255/1025 ,  B01D2255/407 ,  B01D2255/9022 ,  B01D2255/9205 ,  F01N2330/06 ,  F01N2330/48 ,  F01N2370/02 ,  F01N2510/06

摘要： The exhaust gas purification device includes a substrate, a first catalyst layer, and a second catalyst layer. The substrate includes an upstream end, a downstream end, and a porous partition wall defining a plurality of cells extending between the upstream end and the downstream end. The plurality of cells include an inlet cell opening at the upstream end and sealed at the downstream end, and an outlet cell adjacent to the inlet cell sealed at the upstream end and opening at the downstream end. The first catalyst layer is disposed on a surface of the partition wall in an upstream region. In a downstream region, the second catalyst layer is disposed inside the partition wall, and a second catalyst-containing wall including the partition wall and the second catalyst layer has a porosity of 35% or more.