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    Process for producing porous quartz glass object, and optical member for EUV lithography
    5.
    发明授权
    Process for producing porous quartz glass object, and optical member for EUV lithography 失效
    用于生产多孔石英玻璃物体的方法和用于EUV光刻的光学构件

    公开(公告)号：US08356494B2

    公开(公告)日：2013-01-22

    申请号：US13210673

    申请日：2011-08-16

    申请人： Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Akio Koike

    发明人： Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Akio Koike

    IPC分类号： C03B37/018 ,  C03C3/06

    CPC分类号： C03B19/1423 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/20 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/44

    摘要： A process for producing a porous quartz glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.

    摘要翻译： 一种制造多孔石英玻璃体的方法，该方法包括在燃烧器的火焰中水解金属掺杂剂前体和SiO 2前体以形成玻璃微粒，并将形成的玻璃微粒沉积并生长在基材上，其中燃烧器具有 至少两个喷嘴，其中含有（A）金属掺杂剂前体气体，（B）SiO 2前体气体，（C）H 2和O 2的一种气体的混合气体，以及（D）选自以下的一种或多种气体： 一组稀有气体，N 2，CO 2，卤化氢和H 2 O，一部分气体（D）为5-70mol％; 和（E）（C）的H 2和O 2的其它气体彼此供给到燃烧器的不同喷嘴中。

    Glass substrate-holding tool and method for producing an EUV mask blank by employing the same
    6.
    发明授权
    Glass substrate-holding tool and method for producing an EUV mask blank by employing the same 有权
    玻璃基板保持工具及其制造方法

    公开(公告)号：US08967608B2

    公开(公告)日：2015-03-03

    申请号：US13347150

    申请日：2012-01-10

    申请人： Takahiro Mitsumori ,  Takeru Kinoshita ,  Hirotoshi Ise

    发明人： Takahiro Mitsumori ,  Takeru Kinoshita ,  Hirotoshi Ise

    IPC分类号： H01L21/687 ,  C23C14/50 ,  G03F1/24 ,  H01L21/677 ,  H01L21/683

    CPC分类号： C23C14/50 ,  G03F1/24 ,  H01L21/67748 ,  H01L21/6831 ,  H01L21/68728 ,  Y10S269/90 ,  Y10S269/903

    摘要： A glass substrate-holding tool employed during the production of a reflective mask blank for EUV lithography includes an electrostatic chuck and a mechanical chuck. A caught and held portion of a glass substrate caught and held by the electrostatic chuck, and pressed portions of the glass substrate pressed by the mechanical chuck are located outside a quality-guaranteed region on each of a film deposition surface and a rear surface of the glass substrate. The sum of a catching and holding force applied to the glass substrate by the electrostatic chuck and a holding force applied to the glass substrate by the mechanical chuck is at least 200 kgf. A pressing force per unit area applied to the glass substrate by the mechanical chuck is at most 25 kgf/mm2.

    摘要翻译： 在生产用于EUV光刻的反射掩模板的玻璃基板保持工具中，包括静电卡盘和机械卡盘。 由静电卡盘夹住并保持的玻璃基板的被夹持部分和被机械卡盘按压的玻璃基板的按压部分位于膜保护表面和后表面的质量保证区域的外侧 玻璃基板。 通过静电卡盘施加到玻璃基板的抓持力和通过机械卡盘施加到玻璃基板的保持力的总和为至少200kgf。 通过机械卡盘施加到玻璃基板的每单位面积的按压力为25kgf / mm2以下。

    Glass substrate-holding tool and method for producing an EUV mask blank by employing the same
    7.
    发明授权
    Glass substrate-holding tool and method for producing an EUV mask blank by employing the same 有权
    玻璃基板保持工具及其制造方法

    公开(公告)号：US08837108B2

    公开(公告)日：2014-09-16

    申请号：US13475459

    申请日：2012-05-18

    申请人： Takahiro Mitsumori ,  Hirotoshi Ise ,  Takeru Kinoshita

    发明人： Takahiro Mitsumori ,  Hirotoshi Ise ,  Takeru Kinoshita

    IPC分类号： H01L21/683 ,  H01T23/00 ,  G03F1/24

    CPC分类号： H01L21/6831 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24

    摘要： A glass substrate-holding tool, adapted to be employed during the production of a reflective mask blank for EUV lithography (EUVL), includes an electrostatic chuck and a supporting member. The chuck attracts a rear surface of a glass substrate in a non-contact manner by electrostatic attractive force. The supporting member partly supports the rear surface. An area ratio of a projected area of an active surface of the chuck for providing the electrostatic force to an area of a quality-guaranteed region of the rear surface is from 0.5 to 1.0. The active surface is apart from the rear surface by more than 20 μm. The supporting member is configured to support only a region including at least two of four sides defining an outer portion outside the quality-guaranteed region.

    摘要翻译： 适用于制造用于EUV光刻（EUVL）的反射掩模板的玻璃基板保持工具包括静电卡盘和支撑部件。 卡盘通过静电吸引力以非接触的方式吸引玻璃基板的后表面。 支撑构件部分地支撑后表面。 用于提供静电力的卡盘的有效表面的投影面积与后表面的质量保证区域的面积的面积比为0.5至1.0。 活性表面离后表面超过20μm。 支撑构件被构造成仅支撑包括在质量保证区域外部限定外部部分的四个侧面中的至少两个的区域。