摘要:
The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1−90(° C.) to T1−220(° C.) for 120 hours or more.
摘要:
The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1−90(° C.) to T1−220(° C.) for 120 hours or more.
摘要:
The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising: a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1 (° C.), heating the glass body after transparent vitrification at a temperature of T1+400° C. or more for 20 hours or more; and a step of cooling the glass body after the heating step up to T1−400 (° C.) from T1 (° C.) in an average temperature decreasing rate of 10° C./hr or less.
摘要:
The present invention relates to a TiO2-containing silica glass containing TiO2 in an amount of from 5 to 10 mass % and at least one of B2O3, P2O5 and S in an amount of from 50 ppb by mass to 5 mass % in terms of the total content.
摘要翻译:本发明涉及含有5〜10质量%的TiO 2和B 2 O 3,P 2 O 5,S中的至少一种的含TiO 2的二氧化硅玻璃,其量为50ppb〜5质量% 总内容
摘要:
The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ΔTi3+/Ti3+, on an optical use surface, is 0.2 or less.
摘要翻译:本发明涉及一种含有TiO2含量为3〜10质量%的含TiO 2的二氧化硅玻璃的光学构件, Ti3 +浓度为100重量ppm以下; 0-100℃的热膨胀系数,CTE0-100,为0±150ppb /℃。 并且在400〜700nm的波长范围内的内部透射率,每1mm厚度,T400〜700,为80%以上,其中光学部件具有Ti 3+浓度的变化比与Ti 3+的平均值的比值, 在光学用表面上的浓度&Dgr; Ti 3+ / Ti 3+为0.2以下。
摘要:
The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ΔTi3+/Ti3+, on an optical use surface, is 0.2 or less.
摘要翻译:本发明涉及一种含有TiO2含量为3〜10质量%的含TiO 2的二氧化硅玻璃的光学构件, Ti3 +浓度为100重量ppm以下; 0-100℃的热膨胀系数,CTE0-100,为0±150ppb /℃。 并且在400〜700nm的波长范围内的内部透射率,每1mm厚度,T400〜700,为80%以上,其中光学部件具有Ti 3+浓度的变化比与Ti 3+的平均值的比值, 在光学用表面上的浓度&Dgr; Ti 3+ / Ti 3+为0.2以下。
摘要:
The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO2, in which the substrate has two opposite surfaces, and the substrate has temperatures at which a coefficient of linear thermal expansion (CTE) is 0 ppb/° C. (Cross-Over Temperature: COT), and in which the two opposite surfaces have difference in the COTs of 5° C. or more.
摘要:
The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO2, in which the substrate has two opposite surfaces, and the substrate has temperatures at which a coefficient of linear thermal expansion (CTE) is 0 ppb/° C. (Cross-Over Temperature: COT), and in which the two opposite surfaces have difference in the COTs of 5° C. or more.
摘要:
The present invention relates to a method for producing a glass body containing: hydrolyzing a silicon compound and a compound containing a metal serving as a dopant, in a flame projected from a burner to form glass fine particles; and depositing and growing the formed glass fine particles on a base material, in which a raw material mixed gas containing a gas of the silicon compound, a gas of the compound containing a metal serving as a dopant, and either one of a combustible gas and a combustion supporting gas is fed into a central nozzle (A) positioning in the center of the burner; the other gas of the combustible gas and the combustion supporting gas is fed into a nozzle (B) different from the central nozzle (A) of the burner; a combustible gas or a combustion supporting gas is arbitrarily fed into a nozzle different from the nozzles (A) and (B); and a flow rate of the raw material mixed gas is 50% or more and not more than 90% of the largest flow rate among flow rate(s) of the combustible gas(ses) and the combustion supporting gas(ses) fed from other nozzle or nozzles than the central nozzle (A).
摘要:
An acrylic rubber composition which contains, with respect to 100 parts by weight of acrylic rubber, a compound which is expressed by the following general formula (1) in 0.1 to 50 parts by weight and a cross-linking agent in 0.05 to 20 parts by weight is provided. (where, in said general formula (1), Y indicates a chemical single bond or —SO2—. Ra and Rb respectively independently indicate substitutable C1 to C30 organic groups. Za and Zb respectively independently indicate chemical single bonds or —SO2—. n and m respectively independently are 0 or 1, at least one of n and m being 1)