Banknote account and arrangement apparatus
    1.
    发明授权
    Banknote account and arrangement apparatus 失效
    钞票账户和安排设备

    公开(公告)号:US4905840A

    公开(公告)日:1990-03-06

    申请号:US145122

    申请日:1988-01-19

    IPC分类号: G07D3/00 G07D11/00

    摘要: A banknote account and arrangement apparatus includes a supply portion for supplying a bundle of banknotes in the apparatus one after another, a discrimination circuit for discriminating denomination, face, fitness, authenticity, and the like of the supplied banknotes, temporary stackers in which the banknote is stacked in an account mode, closed cassettes coupled to the temporary stackers, open pockets in which the banknote is stacked in an arrangement mode, a RAM for collecting data of the banknote stacked in the temporary stackers, a CPU for verifying the collected data of the banknote stacked in the temporary stackers with known data of the bundle of the banknotes, pushers and shutters for, only when a verification result is correct, stacking the banknote stacked in the temporary stackers in the closed cassettes, and a display portion for displaying the collected data. Sensors detect if the temporary stackers are full. When the sensors detect that the temporary stackers are full in the account mode, a stacking destination of the paper money is changed to the open pockets while continuously collecting the data. After the temporary stackers are replaced with empty ones, the banknote stacked in the open pockets are stacked in the temporary stackers without collecting the data.

    摘要翻译: 纸币账户和布置装置包括用于一个接一个地在装置中提供一捆纸币的供应部分,用于识别所提供的纸币的面额,面部,适合度,真实性等的鉴别电路,其中钞票 以帐户模式堆叠,与临时堆垛机连接的封闭盒,以布置模式堆叠纸币的开口袋,用于收集堆叠在临时堆垛机中的纸币的数据的RAM,用于验证收集的数据的CPU 仅在验证结果正确的情况下,堆叠在临时堆垛机中的纸币,推动器和快门束的已知数据的纸币将堆叠在临时堆垛机中的纸币堆叠在封闭的盒中,以及显示部分 收集数据。 传感器检测临时堆垛机是否已满。 当传感器检测到临时堆垛机在帐户模式下满时,纸币的堆垛目的地被更改为开口袋,同时连续收集数据。 临时堆垛机更换后,堆放在开口袋中的纸币堆放在临时堆垛机中,无需收集数据。

    Negative resist composition and method of forming resist pattern
    2.
    发明授权
    Negative resist composition and method of forming resist pattern 有权
    抗蚀剂组合物和抗蚀剂图案形成方法

    公开(公告)号:US07598017B2

    公开(公告)日:2009-10-06

    申请号:US12258081

    申请日:2008-10-24

    IPC分类号: G03F7/004 G03F7/30

    摘要: A negative resist composition including: a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural unit (f2) having an alkali-soluble group, an alkali-soluble resin component (A) excluding the fluorine-containing resin component (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C). [wherein, R7 represents a fluorinated alkyl group, and a represents either 0 or 1.]

    摘要翻译: 一种负型抗蚀剂组合物,其包含:含有下述通式(f1-0)表示的结构单元(f1)的含氟树脂组分(F)和具有碱溶性基团的结构单元(f2), 不含氟树脂成分(F)的碱溶性树脂成分(A),暴露时产生酸的酸产生剂成分(B)和交联成分(C)。 [其中,R7表示氟化烷基,a表示0或1.]

    NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    3.
    发明申请
    NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
    负极组合物和形成耐力图案的方法

    公开(公告)号:US20090111054A1

    公开(公告)日:2009-04-30

    申请号:US12258081

    申请日:2008-10-24

    IPC分类号: G03F7/027 G03F7/20

    摘要: A negative resist composition including: a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural unit (f2) having an alkali-soluble group, an alkali-soluble resin component (A) excluding the fluorine-containing resin component (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C). [wherein, R7 represents a fluorinated alkyl group, and a represents either 0 or 1.]

    摘要翻译: 一种负型抗蚀剂组合物,其包含:含有下述通式(f1-0)表示的结构单元(f1)的含氟树脂组分(F)和具有碱溶性基团的结构单元(f2), 不含氟树脂成分(F)的碱溶性树脂成分(A),暴露时产生酸的酸产生剂成分(B)和交联成分(C)。 [其中,R7表示氟化烷基,a表示0或1.]

    POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RESIST PATTERN
    4.
    发明申请
    POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RESIST PATTERN 有权
    暴露暴露的积极阻力组成和形成耐力图的方法

    公开(公告)号:US20100196823A1

    公开(公告)日:2010-08-05

    申请号:US12160957

    申请日:2006-12-08

    申请人: Kazuhito Sasaki

    发明人: Kazuhito Sasaki

    IPC分类号: G03F7/004 G03F7/20

    摘要: A positive resist composition for immersion exposure including a resin component (A) which has acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a cyclic principal chain polymer (A1) and a non-cyclic principal chain polymer (A2) having a structural unit (a) derived from acrylic acid as a principal chain, and the non-cyclic principal chain polymer (A2) having a structural unit (a1) derived from an acrylate ester having an acid dissociable, dissolution inhibiting group (p1) represented by general formula (p1) shown below: wherein R1′ and R2′ each independently represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms; n represents an integer of 0 to 3; and Y represents an alkyl group of 1 to 5 carbon atoms or an aliphatic cyclic group of 5 to 16 carbon atoms.

    摘要翻译: 用于浸渍曝光的正型抗蚀剂组合物,包括具有酸解离性,溶解抑制基团并在酸作用下显示出增加的碱溶解性的树脂组分(A)和暴露时产生酸的酸产生剂组分(B),树脂组分 A)包括具有由丙烯酸作为主链的结构单元(a)的环状主链聚合物(A1)和非环状主链聚合物(A2),所述非环状主链聚合物(A2)具有 衍生自具有下述通式(p1)表示的酸解离性,溶解抑制基(p1)的丙烯酸酯的结构单元(a1):其中,R1'和R2'各自独立地表示氢原子或1个烷基 至5个碳原子; n表示0〜3的整数, Y表示碳原子数1〜5的烷基或碳原子数5〜16的脂肪族环状基团。

    Resist composition, multilayer body, and method for forming resist pattern
    5.
    发明授权
    Resist composition, multilayer body, and method for forming resist pattern 有权
    抗蚀剂组合物,多层体和形成抗蚀剂图案的方法

    公开(公告)号:US07544460B2

    公开(公告)日:2009-06-09

    申请号:US10563705

    申请日:2004-07-07

    IPC分类号: G03F7/004 G03F7/30

    摘要: A resist composition is disclosed that enables formation of a favorable resist pattern using a shrink process in which, following formation of the resist pattern, a treatment such as heating is used to narrow the resist pattern, and also disclosed are a laminate and a method for forming a resist pattern that use such a resist composition. This resist composition includes a resin component (A) that displays changed alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure. The component (A) contains structural units derived from a (meth)acrylate ester, and exhibits a glass transition temperature that falls within a range from 120 to 170° C.

    摘要翻译: 公开了一种抗蚀剂组合物,其能够使用收缩方法形成良好的抗蚀剂图案,其中,在形成抗蚀剂图案之后,使用诸如加热的处理来缩小抗蚀剂图案,并且还公开了层压体和方法 形成使用这种抗蚀剂组合物的抗蚀剂图案。 该抗蚀剂组合物包含在酸的作用下显示出碱溶解性变差的树脂成分(A)和曝光时产生酸的酸发生剂成分(B)。 组分(A)含有衍生自(甲基)丙烯酸酯的结构单元,其玻璃化转变温度为120-170℃。

    Money processing apparatus having timer means
    6.
    发明授权
    Money processing apparatus having timer means 失效
    货币处理装置具有计时装置

    公开(公告)号:US5468941A

    公开(公告)日:1995-11-21

    申请号:US274683

    申请日:1994-07-14

    申请人: Kazuhito Sasaki

    发明人: Kazuhito Sasaki

    CPC分类号: G07D11/00

    摘要: A memory processing apparatus according to the present invention includes a function for feeding money one by one, a function for discriminating denominations of the money received from the feeding function, a function for storing the money for each of the denominations discriminated by the discriminating function, a function for producing present time and date, setting predetermined time and date, and outputting a signal when the present time and date coincide with the predetermined time and date respectively, and a function for removing the money from the storing function in response to the signal output from the producing function and forming a bundle of a predetermined number of money.

    摘要翻译: 根据本发明的存储器处理装置包括一个一个地供给货币的功能,用于区分从馈送功能接收到的货币的面额的功能,存储用于由鉴别功能识别的每个面额的货币的功能, 用于产生当前时间和日期,设定预定时间和日期以及当当前时间和日期分别与预定时间和日期一致时的信号的功能,以及响应于该信号从存储功能中移除货币的功能 从生产功能输出并形成一束预定数量的钱。

    Image pickup device and method for processing an interpolated color signal
    7.
    发明授权
    Image pickup device and method for processing an interpolated color signal 有权
    用于处理内插颜色信号的图像拾取装置和方法

    公开(公告)号:US08077234B2

    公开(公告)日:2011-12-13

    申请号:US12179976

    申请日:2008-07-25

    CPC分类号: H04N9/045

    摘要: An image pickup device has a signal processing part configured to perform signal process for the first to third color signals. The signal processing part includes a first color generator configured to generate a fourth color signal corresponding to a reference pixel based on a ratio between a second color signal at a pixel located in vicinity of the reference pixel and a first color signal at a pixel located in vicinity of the reference pixel, a second color generator configured to generate a fifth color signal corresponding to the reference pixel based on a ratio between a third color signal at a pixel located in vicinity of the reference pixel and the first color signal at a pixel located in vicinity of the reference pixel, and a image quality converter configured to generate color signals by performing a predetermined image process based on the first to fifth color signals.

    摘要翻译: 图像拾取装置具有被配置为对第一至第三颜色信号执行信号处理的信号处理部。 信号处理部分包括第一颜色发生器,其被配置为基于位于参考像素附近的像素处的第二颜色信号与位于参考像素附近的像素处的第一颜色信号之间的比率来生成对应于参考像素的第四颜色信号 参考像素的附近,第二颜色发生器,被配置为基于位于参考像素附近的像素处的第三颜色信号与位于所述参考像素附近的第一颜色信号之间的比率来生成对应于参考像素的第五颜色信号 以及图像质量转换器,被配置为通过基于第一至第五颜色信号执行预定图像处理来生成颜色信号。

    Positive resist composition for immersion exposure and method of forming resist pattern
    8.
    发明授权
    Positive resist composition for immersion exposure and method of forming resist pattern 有权
    用于浸渍曝光的正型抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号:US07968269B2

    公开(公告)日:2011-06-28

    申请号:US12160957

    申请日:2006-12-08

    申请人: Kazuhito Sasaki

    发明人: Kazuhito Sasaki

    IPC分类号: G03F7/004 G03F7/30

    摘要: A positive resist composition for immersion exposure including a resin component (A) which has acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a cyclic principal chain polymer (A1) and a non-cyclic principal chain polymer (A2) having a structural unit (a) derived from acrylic acid as a principal chain, and the non-cyclic principal chain polymer (A2) having a structural unit (a1) derived from an acrylate ester having an acid dissociable, dissolution inhibiting group (p1) represented by general formula (p1) shown below: wherein R1′ and R2′ each independently represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms; n represents an integer of 0 to 3; and Y represents an alkyl group of 1 to 5 carbon atoms or an aliphatic cyclic group of 5 to 16 carbon atoms.

    摘要翻译: 用于浸渍曝光的正型抗蚀剂组合物,包括具有酸解离性,溶解抑制基团并在酸作用下显示出增加的碱溶解性的树脂组分(A)和暴露时产生酸的酸产生剂组分(B),树脂组分 A)包括具有由丙烯酸作为主链的结构单元(a)的环状主链聚合物(A1)和非环状主链聚合物(A2),所述非环状主链聚合物(A2)具有 衍生自具有下述通式(p1)表示的酸解离性,溶解抑制基(p1)的丙烯酸酯的结构单元(a1):其中,R1'和R2'各自独立地表示氢原子或1个烷基 至5个碳原子; n表示0〜3的整数, Y表示碳原子数1〜5的烷基或碳原子数5〜16的脂肪族环状基团。

    Positive-working photoresist composition
    10.
    发明授权
    Positive-working photoresist composition 有权
    正光刻胶组合物

    公开(公告)号:US06749989B2

    公开(公告)日:2004-06-15

    申请号:US09996676

    申请日:2001-11-30

    IPC分类号: G03F7004

    摘要: The invention discloses a positive-working photoresist composition suitable for patterning light-exposure with light having a wavelength of 200 nm or shorter. The photoresist composition comprises a resinous compound capable of being imparted with increased solubility in an aqueous alkaline solution by interaction with an acid, a radiation-sensitive acid generating compound capable of generating an acid by irradiation with a radiation and an organic solvent, in which the resinous compound is a copolymer consisting of a combination of three types of specific (meth)acrylate units as the monomeric units. The patterned resist layer formed from the photoresist composition has an advantage in respect of decreased line slimming caused by electron beam irradiation in SEM inspection.

    摘要翻译: 本发明公开了一种正性光致抗蚀剂组合物,其适用于利用波长为200nm或更短的光图案曝光。 光致抗蚀剂组合物包括能够通过与酸的相互作用赋予在碱性水溶液中更高的溶解度的树脂化合物,能够通过辐射和有机溶剂照射产生酸的辐射敏感的产酸化合物,其中 树脂化合物是由作为单体单元的三种特定(甲基)丙烯酸酯单元的组合构成的共聚物。 由光致抗蚀剂组合物形成的图案化抗蚀剂层在SEM检查中对于由电子束照射引起的减少的线减少具有优点。