摘要:
An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要:
A slab type laser apparatus has a slab type gas laser medium part formed in a region defined by a pair of electrode flat plates oppositely disposed in parallel with each other in a space to be filled with a gas laser medium which is excited by high-frequency electric power. The apparatus includes an oscillator part including a pair of resonator mirrors oppositely disposed with a part of the gas laser medium part in between, and for amplifying a laser beam to have predetermined light intensity to emit the laser beam, and the amplifier part including a plurality of return mirrors oppositely disposed with a part of the gas laser medium part in between. The incident laser beam goes and returns plural times between the return mirrors, and the laser beam is amplified to have predetermined power.