Pulse picking laser
    4.
    发明授权

    公开(公告)号:US09882335B2

    公开(公告)日:2018-01-30

    申请号:US15373927

    申请日:2016-12-09

    摘要: A mode locked laser supplies a high repetition seed pulse train along a seed beam path to a pulse picker having at least one polarizer. A Faraday rotator in optical communication with the seed beam rotates the polarization of the seed beam by about 45°. A double pass acousto optical modulator (AOM) receives the seed beam propagating through the Faraday rotator and diffracts the seed beam into a first order first pass beam and a zero order first pass beam. A reflector returns the first pass first order beam into the acousto optical modulator for a second pass. The modulator diffract the beam into a zero order second pass beam and a first order second pass diffracted beam, the first order second pass beam propagating on the substantially same path as the incoming seed beam but in the opposite direction.

    Q-SWITCHED CO2-LASER MATERIAL MACHINING SYSTEM COMPRISING ACOUSTO-OPTIC MODULATORS

    公开(公告)号:US20170310070A1

    公开(公告)日:2017-10-26

    申请号:US15512607

    申请日:2015-07-22

    摘要: A Q-switched CO2 laser material processing system with acousto-optic modulators (AOM) is employed, on the one hand, inside the resonator for Q-switching the CO2 laser and, on the other hand, externally for efficient suppression of the radiation feedback between a laser and workpiece. The frequency shift of the radiation diffracted at the AOM is taken into account which exactly corresponds to the excitation frequency of the acoustic wave in the AOM crystal under the aspect of the amplification of the radiation in the active medium. Since this frequency shift significantly reduces the amplification of the radiation, it has to be avoided in the Q-switching process, which is achieved, by means of a tandem of two AOMs with identical excitation frequencies but with the acoustic waves propagating in opposite directions in the crystal. The frequency shift advantageously suppresses radiation feedback between the laser and workpiece.

    OPTICAL ISOLATION MODULE
    10.
    发明申请

    公开(公告)号:US20170099721A1

    公开(公告)日:2017-04-06

    申请号:US14970402

    申请日:2015-12-15

    IPC分类号: H05G2/00

    摘要: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.