公开(公告)号：US20110228258A1

公开(公告)日：2011-09-22

申请号：US13118004

申请日：2011-05-27

申请人： Akira HAMAMATSU ,  Minori NOGUCHI ,  Yoshimasa OHSHIMA ,  Sachio UTO ,  Taketo UENO ,  Hiroyuki NAKANO ,  Takahiro JINGU ,  Hisashi HATANO ,  Yukihisa MOHARA ,  Seiji OTANI ,  Takahiro TOGASHI

发明人： Akira HAMAMATSU ,  Minori NOGUCHI ,  Yoshimasa OHSHIMA ,  Sachio UTO ,  Taketo UENO ,  Hiroyuki NAKANO ,  Takahiro JINGU ,  Hisashi HATANO ,  Yukihisa MOHARA ,  Seiji OTANI ,  Takahiro TOGASHI

IPC分类号： G01N21/88

CPC分类号： G01N21/956

摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

摘要翻译： 通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射， 根据要检测的缺陷的种类从照明光源发射的光束。 通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率 形状光通量。 通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

公开(公告)号：US20100208251A1

公开(公告)日：2010-08-19

申请号：US12771842

申请日：2010-04-30

申请人： Hiroyuki YAMASHITA ,  Yukihisa MOHARA ,  Eiji IMAI

发明人： Hiroyuki YAMASHITA ,  Yukihisa MOHARA ,  Eiji IMAI

IPC分类号： G01N21/88

CPC分类号： H01L21/67288 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N21/95607 ,  G01N2021/95615

摘要： An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage,a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.

摘要翻译： 检查装置包括用于承载晶片的晶片台，在晶片载物台上承载的晶片上照射检查光束的照明模块，检测来自晶片台上的晶片的散射光线或反射光线的检测模块，并输出图像 信号，存储关于晶片上的各个检查区域的布置的信息的坐标控制模块，以及不完备区域识别模块，其基于存储在坐标控制模块中的检查区域布置信息识别出不完美的检查区域干扰 具有晶片边缘。

公开(公告)号：US20110285989A1

公开(公告)日：2011-11-24

申请号：US13197762

申请日：2011-08-03

申请人： Hiroyuki YAMASHITA ,  Yukihisa MOHARA ,  Eiji IMAI

发明人： Hiroyuki YAMASHITA ,  Yukihisa MOHARA ,  Eiji IMAI

IPC分类号： G01N21/88

CPC分类号： H01L21/67288 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N21/95607 ,  G01N2021/95615

摘要： An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.

摘要翻译： 检查装置包括用于承载晶片的晶片台，在晶片载物台上承载的晶片上照射检查光束的照明模块，检测来自晶片台上的晶片的散射光线或反射光线的检测模块，并输出图像 信号，存储关于晶片上的各个检查区域的布置的信息的坐标控制模块，以及不完备区域识别模块，其基于存储在坐标控制模块中的检查区域布置信息识别出不完美的检查区域干扰 具有晶片边缘。

公开(公告)号：US20080239319A1

公开(公告)日：2008-10-02

申请号：US12057168

申请日：2008-03-27

申请人： Hiroyuki YAMASHITA ,  Yukihisa MOHARA ,  Eiji Imai

发明人： Hiroyuki YAMASHITA ,  Yukihisa MOHARA ,  Eiji Imai

IPC分类号： G01B11/00 ,  G01N21/47

CPC分类号： H01L21/67288 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N21/95607 ,  G01N2021/95615

摘要： An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.

摘要翻译： 检查装置包括用于承载晶片的晶片台，在晶片载物台上承载的晶片上照射检查光束的照明模块，检测来自晶片台上的晶片的散射光线或反射光线的检测模块，并输出图像 信号，存储关于晶片上的各个检查区域的布置的信息的坐标控制模块，以及不完备区域识别模块，其基于存储在坐标控制模块中的检查区域布置信息识别出不完美的检查区域干扰 具有晶片边缘。