公开(公告)号：US08884207B2

公开(公告)日：2014-11-11

申请号：US13821246

申请日：2011-07-26

申请人： Hiroshi Kawaguchi ,  Takahiro Jingu

发明人： Hiroshi Kawaguchi ,  Takahiro Jingu

IPC分类号： H01L27/00 ,  H04N3/14 ,  H04N5/347 ,  H04N5/372 ,  H01L27/146 ,  G01N21/95 ,  G01N21/88

CPC分类号： H01L27/14601 ,  G01N21/8806 ,  G01N21/9501 ,  H04N5/347 ,  H04N5/37206 ,  H04N5/37213

摘要： Provided are a photoelectric conversion element, wherein the processing speed can be increased and resolution can be changed without increasing cost, and a defect inspecting apparatus and a defect inspecting method using the photoelectric conversion element. A photoelectric conversion element having a plurality of sensor pixels has a multiplexer and a plurality of horizontal transfer registers. Sensor pixels are divided into a plurality of blocks such that the sensor pixels correspond to each of the horizontal transfer registers. The photoelectric conversion element is configured such that charges of the blocks are read by means of the multiplexer via respective corresponding horizontal transfer registers, and are outputted via the multiplexer.

摘要翻译： 提供一种光电转换元件，其中可以提高处理速度并且可以在不增加成本的情况下改变分辨率，以及使用光电转换元件的缺陷检查装置和缺陷检查方法。 具有多个传感器像素的光电转换元件具有多路复用器和多个水平传送寄存器。 传感器像素被分成多个块，使得传感器像素对应于每个水平传送寄存器。 光电转换元件被配置为使得通过多路复用器经由相应的水平传送寄存器读取块的电荷，并且经由多路复用器输出。

公开(公告)号：US20140198321A1

公开(公告)日：2014-07-17

申请号：US14240669

申请日：2012-07-27

申请人： Masaaki Ito ,  Takahiro Jingu ,  Hisashi Hatano

发明人： Masaaki Ito ,  Takahiro Jingu ,  Hisashi Hatano

IPC分类号： G01B11/24 ,  G01N21/55

CPC分类号： G01B11/303 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/4738 ,  G01N21/55 ,  G01N21/9501 ,  G01N2201/12

摘要： In related art, consideration is not given to that a spatial distribution of scattered light changes in various direction such as forward/backward/sideways according to a difference in micro roughness. Particularly, although a step-terrace structure appearing on an epitaxial growth wafer produces anisotropy in the scattered light distribution, consideration is not given to this point in the related art. The invention includes a process in which light is illuminated to a sample surface, plural detection optical systems mutually different in directions of optical axes detect a spatial distribution of scattered light, and a spatial frequency spectrum of the sample surface is calculated.

摘要翻译： 在现有技术中，不考虑散射光的空间分布根据微粗糙度的差异而在各种方向如前后/侧面变化。 特别地，虽然出现在外延生长晶片上的台阶平台结构在散射光分布中产生各向异性，但是在现有技术中没有考虑到这一点。 本发明包括将光照射到样品表面的方法，在光轴方向上彼此不同的多个检测光学系统检测散射光的空间分布，并且计算样品表面的空间频谱。

公开(公告)号：US20130286387A1

公开(公告)日：2013-10-31

申请号：US13996613

申请日：2011-11-25

申请人： Masami Makuuchi ,  Takahiro Jingu

发明人： Masami Makuuchi ,  Takahiro Jingu

IPC分类号： G01N21/95

CPC分类号： G01N21/9501

摘要： When the intensity of scattering light from a defect on a sample becomes very low according to the diameter of the defect, the dark noise from a sensor device itself accounts which a large proportion of the detected signal outputted from the sensor and thus it is difficult to detect minute defects. Furthermore, since a laser light source is pulsed into oscillation, pulse components from the laser light source are superimposed on the detected signal outputted from the sensor, and therefore it is difficult to detect defects with high accuracy. The present invention is a defect inspection device having irradiation means which producing pulsed operation and irradiating a surface of a sample with a laser beam, detection means which detecting scattering light generated at the surface of the sample in response to the irradiation provided by the irradiation means, and a processing portion which generating a delay signal based on the laser beam emitted by the irradiation means and processing the scattering light detected by the detection means using the delay signal.

摘要翻译： 当来自样品的缺陷的散射光的强度根据缺陷的直径变得非常低时，来自传感器装置本身的暗噪声考虑到从传感器输出的检测信号的大部分，因此难以 检测微小缺陷。 此外，由于激光光源被脉冲振荡，所以来自激光光源的脉冲成分叠加在从传感器输出的检测信号上，因此难以高精度地检测出缺陷。 本发明是一种具有产生脉冲操作并用激光束照射样品表面的照射装置的检测装置，检测装置响应于由照射装置提供的照射而检测在样品表面产生的散射光 以及处理部，其基于由照射装置发射的激光束产生延迟信号，并使用延迟信号处理由检测装置检测到的散射光。

公开(公告)号：US20130286191A1

公开(公告)日：2013-10-31

申请号：US13997496

申请日：2011-11-02

申请人： Masaaki Ito ,  Hidetoshi Nishimura ,  Takahiro Jingu

发明人： Masaaki Ito ,  Hidetoshi Nishimura ,  Takahiro Jingu

IPC分类号： H04N7/18

CPC分类号： H04N7/18 ,  G01N21/47 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a defect inspecting apparatus, the strength of a fatal defect signal decreases due to miniaturization. Thus, in order to assure a high SN ratio, it is necessary to reduce noises caused by scattered light from a wafer. Roughness of a pattern edge and surface roughness which serve as a scattered-light source are spread over the entire wafer. The present invention has discovered the fact that reduction of an illuminated area is a technique effective for decreasing noises. That is to say, the present invention has discovered the fact that creation of an illuminated area having a spot shape and reduction of the dimension of a spot beam are effective. A plurality of temporally and spatially divided spot beams are radiated to the wafer serving as a sample.

摘要翻译： 在缺陷检查装置中，致命缺陷信号的强度由于小型化而降低。 因此，为了确保高的SN比，需要减少由晶片散射的光产生的噪声。 用作散射光源的图案边缘和表面粗糙度的粗糙度分布在整个晶片上。 本发明已经发现，减少照明区域是有效降低噪声的技术。 也就是说，本发明已经发现了具有斑点形状的照明区域的创建和点光束的尺寸的减小的事实是有效的。 将多个时间上和空间上分开的光束照射到作为样品的晶片。

公开(公告)号：US08563958B2

公开(公告)日：2013-10-22

申请号：US13328768

申请日：2011-12-16

申请人： Kazuo Takahashi ,  Takahiro Jingu

发明人： Kazuo Takahashi ,  Takahiro Jingu

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01N2021/8896 ,  G01N2021/8928

摘要： Reflected light caused by the state of the surface of a wafer, a foreign material, or a defect is superimposed on a haze frequency component caused by the type and thickness of a film or a surface irregularity. In order to detect a haze frequency component caused by a haze present on the surface of an object to be inspected, light propagating from the object to be inspected is detected and converted into an electric signal. The electric signal is sampled at a predetermined sampling time interval and converted into digital data. A frequency component caused by a foreign material, a defect or the like is separated from the digital data to ensure that a haze frequency component is selected. The haze frequency component is caused by a stain attached to the surface of the wafer, hazy tarnish, a surface irregularity or the like.

摘要翻译： 由晶片的表面状态，异物或缺陷引​​起的反射光叠加在由膜的类型和厚度或表面不规则性引起的雾度频率分量上。 为了检测由待检查物体的表面上存在的雾度引起的雾度频率分量，检测从被检查物体传播的光，并将其转换为电信号。 以预定的采样时间间隔采样电信号并将其转换为数字数据。 由异物引起的频率分量，缺陷等与数字数据分离，以确保选择雾度频率分量。 雾度频率分量由附着在晶片表面的污迹，模糊晦暗，表面不规则等引起。

公开(公告)号：US20130010281A1

公开(公告)日：2013-01-10

申请号：US13621121

申请日：2012-09-15

申请人： Izuo Horai ,  Hirokazu Koyabu ,  Yuta Urano ,  Takahiro Jingu

发明人： Izuo Horai ,  Hirokazu Koyabu ,  Yuta Urano ,  Takahiro Jingu

IPC分类号： G01N21/956

CPC分类号： G01N21/9501 ,  G01N21/65 ,  G01N21/9505 ,  G01N2021/4711 ,  G01N2021/473 ,  G01N2021/8861 ,  G01N2021/8864

摘要： An inspection method and an inspection device, or apparatus each capable of conducting composition analysis of a defect detected by elastic or stokes scattered light, an inspection surface or defect on the surface of the inspection surface, or a defect on the surface of the inspection object and its internal composition. A surface inspection method for optically detecting elastic or stokes scattering or inelastic or anti-stokes scattered light from inside the surface of the inspection object, for detecting existence of defects of the inspection object and features of the defects, for detecting positions of the detected defects on the surface of the inspection object, classifying and analyzing the detected defects in accordance with their features on the basis of the positions of the defects and the features of the defects or the classification result of the defects.

公开(公告)号：US20120262709A1

公开(公告)日：2012-10-18

申请号：US13529363

申请日：2012-06-21

申请人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

发明人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

IPC分类号： G01N21/88

CPC分类号： G01N21/00 ,  G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148

摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.

摘要翻译： 一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像 由第一和第二照明单元照亮。

公开(公告)号：US08101935B2

公开(公告)日：2012-01-24

申请号：US12272211

申请日：2008-11-17

申请人： Kazuo Takahashi ,  Takahiro Jingu

发明人： Kazuo Takahashi ,  Takahiro Jingu

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01N2021/8896 ,  G01N2021/8928

摘要： Reflected light caused by the state of the surface of a wafer, a foreign material or a defect is superimposed on a haze frequency component caused by the type and thickness of a film or a surface irregularity. It has therefore been difficult to accurately measure the haze frequency component by use of a fixed threshold value. In order to detect a haze frequency component caused by a haze present on the surface of an object to be inspected, light propagating from the object to be inspected is detected and converted into an electric signal. The electric signal is sampled at a predetermined sampling time interval and converted into digital data. A frequency component caused by a foreign material, a defect or the like is separated from the digital data to ensure that a haze frequency component is selected. The haze frequency component is caused by a stain attached to the surface of the wafer, hazy tarnish, a surface irregularity or the like.

摘要翻译： 由晶片表面的状态，异物或缺陷引​​起的反射光叠加在由膜的类型和厚度或表面不规则性引起的雾度频率分量上。 因此，难以通过使用固定的阈值来精确地测量雾度频率分量。 为了检测由待检查物体的表面上存在的雾度引起的雾度频率分量，检测从被检查物体传播的光，并将其转换为电信号。 以预定的采样时间间隔采样电信号并将其转换为数字数据。 由异物引起的频率分量，缺陷等与数字数据分离，以确保选择雾度频率分量。 雾度频率分量由附着在晶片表面的污迹，模糊晦暗，表面不规则等引起。

公开(公告)号：US20110310382A1

公开(公告)日：2011-12-22

申请号：US13221935

申请日：2011-08-31

申请人： Sachio UTO ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

发明人： Sachio UTO ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

IPC分类号： G01N21/00

CPC分类号： G01N21/00 ,  G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148

摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.

摘要翻译： 一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像 由第一和第二照明单元照亮。

公开(公告)号：US07990529B2

公开(公告)日：2011-08-02

申请号：US12266663

申请日：2008-11-07

申请人： Masami Makuuchi ,  Ritsuro Orihashi ,  Takahiro Jingu

发明人： Masami Makuuchi ,  Ritsuro Orihashi ,  Takahiro Jingu

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/8851 ,  G01N21/94

摘要： In a foreign matter inspection apparatus for a semiconductor wafer, a PMT which detects reflection light, an amplifier which amplifies a signal detected by the PMT and in which response characteristics of amplification are controlled by a control signal, an A/D converter which converts the signal amplified by the amplifier into a predetermined code and outputs the code, a control circuit which generates a control signal based on information of the semiconductor wafer having a correlation with the reflection light, and a data processing circuit which detects a foreign matter on the semiconductor wafer based on the code output from the A/D converter are provided.

摘要翻译： 在半导体晶片的异物检查装置中，检测反射光的PMT，放大由PMT检测出的信号的放大器，其中由控制信号控制放大的响应特性的放大器，A / D转换器 信号由放大器放大成预定码并输出该代码;基于与反射光相关的半导体晶片的信息产生控制信号的控制电路;以及检测半导体上的异物的数据处理电路 提供了基于A / D转换器的代码输出的晶片。