Methods and apparatus for simultaneous multi-sided coating of optical
thin film designs using dual-frequency plasma-enhanced chemical vapor
deposition
    2.
    发明授权
    Methods and apparatus for simultaneous multi-sided coating of optical thin film designs using dual-frequency plasma-enhanced chemical vapor deposition 失效
    使用双频等离子体增强化学气相沉积的光学薄膜设计的同时多面涂覆的方法和装置

    公开(公告)号:US5789040A

    公开(公告)日:1998-08-04

    申请号:US861246

    申请日:1997-05-21

    摘要: The present invention is directed to methods and apparatus for depositing optical thin film coatings simultaneously onto both sides of at least one substrate in a dual-frequency plasma-enhanced chemical vapor deposition vacuum reaction chamber utilizing microwave and radio frequency energies. The substrate can be a continuous substrate, such as a flexible polymer web, or it can be one or more discrete substrates, such as rigid plastic, glass, or glass/polymer composite substrates. The substrate can be processed in a stationary or an in-line processing mode. In addition, the coatings deposited simultaneously onto both sides of the substrate can be identical, i.e. symmetrical, or different, i.e., non-symmetrical. The plasma attributes and reaction conditions on either side of the substrate can be independently controlled to provide either identical or different coating compositions and properties on the two sides of the substrate. Multiple plasmas can also be generated, in either an overlapping or isolated manner, to form multiple independently-controlled CVD reaction zones for simultaneous deposition of either identical or different coatings onto the sides of the substrate within the different zones.

    摘要翻译: 本发明涉及使用微波和射频能量的双频等离子体增强化学气相沉积真空反应室中的至少一个衬底的两侧同时沉积光学薄膜涂层的方法和装置。 衬底可以是连续衬底,例如柔性聚合物网,或者其可以是一个或多个离散衬底,例如刚性塑料,玻璃或玻璃/聚合物复合衬底。 衬底可以以静止或在线处理模式进行处理。 此外,同时沉积在基底的两侧上的涂层可以是相同的,即对称的或不同的,即非对称的。 可以独立地控制衬底两侧的等离子体属性和反应条件,以在衬底的两侧提供相同或不同的涂层组合物和性质。 也可以以重叠或隔离的方式产生多个等离子体,以形成多个独立控制的CVD反应区,以将相同或不同的涂层同时沉积到不同区域内的衬底的侧面上。

    Polymeric optical substrate method of treatment
    3.
    发明授权
    Polymeric optical substrate method of treatment 失效
    聚合物光学底物的处理方法

    公开(公告)号:US6156394A

    公开(公告)日:2000-12-05

    申请号:US63622

    申请日:1998-04-17

    IPC分类号: G02B1/10 G21K5/04 H05H1/00

    CPC分类号: G02B1/10 G21K5/04

    摘要: A pretreatment method for use in manufacturing an improved optical component comprises (i) providing a polymeric optical substrate; and (ii) exposing the polymeric optical substrate to electromagnetic energy having a wavelength of about 30 nm to about 350 nm. The exposure of the polymeric optical substrate to the electromagnetic energy substantially improves adhesion between the substrate and an optical coating deposited onto the substrate following pretreatment. The invention addresses the significant need for coated plastic optics by providing a method to achieve reliable adhesion of optical coatings placed on polymeric optical substrates. Specifically, this invention enables improved adhesion for even highly curved or shaped parts which have been historically more difficult to coat. The pretreatment method is particularly useful for molded substrates such as molded polymethylmethacrylate.

    摘要翻译: 用于制造改进的光学部件的预处理方法包括(i)提供聚合物光学基底; 和(ii)将聚合物光学基底暴露于波长为约30nm至约350nm的电磁能。 聚合物光学基底对电磁能的暴露基本上改善了在预处理之后基底和沉积在基底上的光学涂层之间的粘合性。 本发明通过提供一种方法来实现对聚合物光学基底上放置的光学涂层的可靠附着,解决了涂覆塑料光学器件的显着需要。 具体地说,本发明能够改善在历史上难以涂覆的均匀高度弯曲或成形的部件上的附着力。 预处理方法对于模制的聚甲基丙烯酸甲酯等成型基材特别有用。