公开(公告)号：US08068209B2

公开(公告)日：2011-11-29

申请号：US12073783

申请日：2008-03-10

申请人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Guarav Keswani ,  Derek Coon

发明人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Guarav Keswani ,  Derek Coon

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the other side when the substrate is moved. The apparatus includes a substrate holder to hold the substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through the immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. The diverter element is positioned between the immersion element and the substrate. The diverter element alters the footprint shape of the meniscus of the body of immersion liquid, thereby preventing or reducing the amount of leakage from a space between the substrate and the immersion element.

摘要翻译： 浸没式光刻工具，其具有位于浸没元件和基底之间的转向元件，用于改变在最后的光学元件与一侧的浸没元件之间的浸没液体的弯液面的“占地”或形状，以及 当基板移动时在另一侧的基板。 该装置包括用于保持具有成像表面的基板的基板保持器和具有最后光学元件的投影光学系统。 投影光学系统通过填充在基板的成像表面和最后一个光学元件之间的间隙中的浸渍液体将图像投影到基板上的目标成像区域上。 浸没元件将浸没液保持在间隙中。 分流器元件位于浸没元件和基底之间。 分流器元件改变浸没液体的弯液面的足迹形状，从而防止或减少从基板和浸没元件之间的空间的泄漏量。