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1.发明授权Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool 有权喷嘴有助于减少浸没式光刻工具浸没液体的逸出公开(公告)号：US08068209B2
公开(公告)日：2011-11-29
申请号：US12073783
申请日：2008-03-10
CPC分类号： G03F7/70341
摘要： An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the other side when the substrate is moved. The apparatus includes a substrate holder to hold the substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through the immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. The diverter element is positioned between the immersion element and the substrate. The diverter element alters the footprint shape of the meniscus of the body of immersion liquid, thereby preventing or reducing the amount of leakage from a space between the substrate and the immersion element.
摘要翻译： 浸没式光刻工具，其具有位于浸没元件和基底之间的转向元件，用于改变在最后的光学元件与一侧的浸没元件之间的浸没液体的弯液面的“占地”或形状，以及 当基板移动时在另一侧的基板。 该装置包括用于保持具有成像表面的基板的基板保持器和具有最后光学元件的投影光学系统。 投影光学系统通过填充在基板的成像表面和最后一个光学元件之间的间隙中的浸渍液体将图像投影到基板上的目标成像区域上。 浸没元件将浸没液保持在间隙中。 分流器元件位于浸没元件和基底之间。 分流器元件改变浸没液体的弯液面的足迹形状，从而防止或减少从基板和浸没元件之间的空间的泄漏量。
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公开(公告)号：US08610873B2
公开(公告)日：2013-12-17
申请号：US12382100
申请日：2009-03-09
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/52
摘要： An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.
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公开(公告)号：US20090002648A1
公开(公告)日：2009-01-01
申请号：US11987788
申请日：2007-12-04
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A gas curtain type immersion lithography apparatus has a fluid removing porous region adjacent the gas inlet to prevent evaporative cooling. The apparatus includes a substrate holder which holds a substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through an immersion fluid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. Gas is provided through an inlet into the gap. A porous region is provided adjacent the gas inlet. Immersion fluid that collects near the gas inlet is removed by the porous region.
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4.发明申请Apparatus, systems and methods for removing liquid from workpiece during workpiece processing 审中-公开在工件加工过程中从工件上清除液体的设备，系统和方法公开(公告)号：US20080225248A1
公开(公告)日：2008-09-18
申请号：US12073865
申请日：2008-03-11
CPC分类号： G03F7/70341
摘要： Apparatus, systems and methods remove liquid from a workpiece. A first station subjects a workpiece to processing that leaves a liquid on a surface of the workpiece. A second station is disposed at a location spaced apart from the first station. A porous member is disposed between the first and second stations. The porous member has a liquid-phyllic surface that faces the workpiece and is spaced from a surface of the workpiece by a gap. The porous member has a length in a direction perpendicular to a movement direction in which the workpiece moves from the first station to the second station, the length being at least as large as a dimension of the workpiece in the direction perpendicular to the movement direction.
摘要翻译： 设备，系统和方法从工件中清除液体。 第一工位对工件进行处理，在工件的表面上留下液体。 第二站设置在与第一站间隔开的位置处。 多孔构件设置在第一和第二站之间。 多孔构件具有面向工件的液态表面，并且与工件的表面间隔开间隙。 多孔构件具有与工件从第一工位移动到第二工位的移动方向垂直的方向上的长度，其长度至少与工件沿与移动方向垂直的方向的尺寸一样大。
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5.发明申请Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine 有权在浸没式光刻机中的晶片更换期间将浸没流体保持在光学组件附近的装置和方法公开(公告)号：US20080225246A1
公开(公告)日：2008-09-18
申请号：US11976898
申请日：2007-10-29
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70733
摘要： Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.
摘要翻译： 装置和方法将浸没液体保持在与光学组件相邻的空间中。 光学组件通过衬底台将图像投影到靠近光学组件支撑的衬底上。 可插入到光学组件和衬底之间的空间，衬底台或两者中的插入构件将浸没液体分成第一部分和第二部分，第一部分设置在光学组件和插入构件之间， 第二部分设置在插入构件和衬底之间，衬底台或两者。 当基板移动远离邻近光学组件时，插入构件保持光学组件与第一部分接触。
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6.发明申请APPARATUS AND METHODS FOR KEEPING IMMERSION FLUID ADJACENT TO AN OPTICAL ASSEMBLY DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE 有权用于在浸没式切割机中的波形交换期间保持与光学组件相关的流体流体的装置和方法公开(公告)号：US20120262687A1
公开(公告)日：2012-10-18
申请号：US13532195
申请日：2012-06-25
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70733
摘要： Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.
摘要翻译： 装置和方法将浸没液体保持在与光学组件相邻的空间中。 光学组件通过衬底台将图像投影到靠近光学组件支撑的衬底上。 可插入到光学组件和衬底之间的空间，衬底台或两者中的插入构件将浸没液体分成第一部分和第二部分，第一部分设置在光学组件和插入构件之间， 第二部分设置在插入构件和衬底之间，衬底台或两者。 当基板移动远离邻近光学组件时，插入构件保持光学组件与第一部分接触。
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公开(公告)号：US20100271159A1
公开(公告)日：2010-10-28
申请号：US12718600
申请日：2010-03-05
IPC分类号： H01F5/00
CPC分类号： H01F7/08 , G03F7/70858 , G03F7/709 , H01F5/00 , H01F27/2876
摘要： Methods and apparatus for improving the thermal performance of electromagnetic coils are disclosed. According to one aspect of the present invention, an electromagnetic actuator includes a core and a coil. The coil is formed form a conductor wire that includes a plurality of windings. The windings are arranged around the core, and include at least a first set of windings and a second set of windings. The first set of windings has a different geometry from the second set of windings.
摘要翻译： 公开了用于改善电磁线圈的热性能的方法和装置。 根据本发明的一个方面，电磁致动器包括芯和线圈。 线圈形成为包括多个绕组的导线。 绕组围绕芯布置，并且包括至少第一组绕组和第二组绕组。 第一组绕组具有与第二组绕组不同的几何形状。
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8.发明授权Gas curtain type immersion lithography tool using porous material for fluid removal 有权使用多孔材料进行流体清除的气帘式浸没式光刻工具公开(公告)号：US07576833B2
公开(公告)日：2009-08-18
申请号：US11987788
申请日：2007-12-04
CPC分类号： G03F7/70341
摘要： A gas curtain type immersion lithography apparatus has a fluid removing porous region adjacent the gas inlet to prevent evaporative cooling. The apparatus includes a substrate holder which holds a substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through an immersion fluid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. Gas is provided through an inlet into the gap. A porous region is provided adjacent the gas inlet. Immersion fluid that collects near the gas inlet is removed by the porous region.
摘要翻译： 气帘式浸没式光刻装置具有与气体入口相邻的流体去除多孔区域，以防止蒸发冷却。 该装置包括保持具有成像表面的基板和具有最后光学元件的投影光学系统的基板保持器。 投影光学系统通过填充在基板的成像表面和最后一个光学元件之间的间隙中的浸没流体将图像投影到基板上的目标成像区域上。 浸没元件将浸没液保持在间隙中。 通过进入间隙的入口提供气体。 在气体入口附近设置多孔区域。 通过多孔区域去除在气体入口附近收集的浸液。
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9.发明申请Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatus 审中-公开用于减少浸没式光刻设备浸没液体逸出的装置和方法公开(公告)号：US20080231823A1
公开(公告)日：2008-09-25
申请号：US12076501
申请日：2008-03-19
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A stage assembly includes a workpiece table that supports the workpiece adjacent to an optical assembly. An environmental system supplies and removes immersion liquid to and from a space between the workpiece and the optical assembly to form an immersion area. The environmental system has a lower surface disposed opposite from an upper surface of the workpiece and/or the workpiece table. The lower surface is spaced a first distance from the workpiece and/or the workpiece table to form a meniscus at a periphery of the immersion area. An edge member is provided on the environmental system and extends past the lower surface of the environmental system so that a lower portion of the edge member is spaced a second distance, smaller than the first distance, from the upper surface of the workpiece and/or the workpiece table at a position beyond the periphery of the immersion area.
摘要翻译： 台架组件包括支撑邻近光学组件的工件的工件台。 环境系统将浸入液体从工件和光学组件之间的空间提供并移除，以形成浸入区域。 环境系统具有与工件的上表面和/或工件台相对设置的下表面。 下表面与工件和/或工件台间隔开第一距离，以在浸没区域的周边形成弯液面。 边缘构件设置在环境系统上并且延伸越过环境系统的下表面，使得边缘构件的下部与工件的上表面间距第二距离小于第一距离，并且/ 工件台在超过浸没区域周边的位置。
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公开(公告)号：US08934080B2
公开(公告)日：2015-01-13
申请号：US13617251
申请日：2012-09-14
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
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