LED Solar Illuminator
    1.
    发明申请
    LED Solar Illuminator 失效
    LED太阳能照明器

    公开(公告)号:US20120256559A1

    公开(公告)日:2012-10-11

    申请号:US13081734

    申请日:2011-04-07

    IPC分类号: H05B37/02

    CPC分类号: H05B33/0803

    摘要: An apparatus for illuminating a target surface, the apparatus having a plurality of LED arrays, where each of the arrays has a plurality of individually addressable LEDs, and where at least one of the arrays is disposed at an angle of between about forty-five degrees and about ninety degrees relative to the target surface, where all of the arrays supply light into a light pipe, the light pipe having interior walls made of a reflective material, where light exiting the light pipe illuminates the target surface, and a controller for adjusting an intensity of the individually addressable light sources.

    摘要翻译: 一种用于照射目标表面的装置,该装置具有多个LED阵列,其中每个阵列具有多个独立可寻址的LED,并且其中至少一个阵列以大约四十五度之间的角度设置 并且相对于目标表面大约九十度,其中所有的阵列将光提供到光管中,光管具有由反射材料制成的内壁,其中离开光管的光照射目标表面,以及用于调节的控制器 独立寻址光源的强度。

    Modulated reflectance measurement system with multiple wavelengths
    2.
    发明授权
    Modulated reflectance measurement system with multiple wavelengths 有权
    多波长调制反射测量系统

    公开(公告)号:US07423757B2

    公开(公告)日:2008-09-09

    申请号:US11492583

    申请日:2006-07-25

    IPC分类号: G01N21/55

    摘要: A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

    摘要翻译: 调制反射测量系统包括三个基于单色二极管的激光器。 每个激光器可以作为探测光束或作为泵浦光源操作。 使用一系列反射镜和分束器将激光输出重定向到达物镜。 物镜将激光输出聚焦在样品上。 反射能量通过目标返回,并被分束器重定向到检测器。 锁定放大器转换检测器的输出以产生正交(Q)和同相(I)信号用于分析。 处理器使用Q和/或I信号来分析样本。 通过改变用作泵浦或探针光束源的激光器的数量,可以优化测量系统以测量不同样品类型的范围。

    Methods for depth profiling in semiconductors using modulated optical reflectance technology
    3.
    发明申请
    Methods for depth profiling in semiconductors using modulated optical reflectance technology 有权
    采用调制光学反射技术的半导体深度剖面方法

    公开(公告)号:US20080151247A1

    公开(公告)日:2008-06-26

    申请号:US11998118

    申请日:2007-11-28

    IPC分类号: G01N21/55

    摘要: Methods of obtaining dopant and damage depth profile information are disclosed using modulated optical reflectivity (MOR) measurements. In one aspect, the depth profile is constructed using information obtained from various measurements such as the junction depth, junction abruptness and dopant concentration. In another aspect, a full theoretical model is developed. Actual measurements are fed to the model. Using an iterative approach, the actual measurements are compared to theoretical measurements calculated from the model to determine the actual depth profile.

    摘要翻译: 使用调制光学反射率(MOR)测量公开了获得掺杂剂和损伤深度分布信息的方法。 在一个方面,使用从诸如结深度,结突起和掺杂剂浓度的各种测量获得的信息来构建深度分布。 另一方面,开发了一个完整的理论模型。 实际测量被馈送到模型。 使用迭代方法,将实际测量与从模型计算的理论测量值进行比较,以确定实际深度分布。

    Method for measuring ion-implanted semiconductors with improved repeatability
    7.
    发明申请
    Method for measuring ion-implanted semiconductors with improved repeatability 失效
    用于测量具有改善的重复性的离子注入半导体的方法

    公开(公告)号:US20050195399A1

    公开(公告)日:2005-09-08

    申请号:US11067961

    申请日:2005-02-28

    IPC分类号: G01N21/55

    CPC分类号: G01N21/171 H01L22/12

    摘要: The repeatability of wafer uniformity measurements can be increased by taking spatially averaged measurements of wafer response. By increasing the time over which measurements are obtained, the amount of noise can be significantly reduced, thereby improving the repeatability of the measurements. These measurements can be taken at several locations on the wafer to ensure wafer uniformity. In order to get a stable and repeatable assessment of the wafer process, addressing uncertainties related to damage relaxation or incomplete anneal, an anneal decay factor (ADF) characterization can be performed at a distance away from the TW measurement boxes. From the ADF measurement and the spatially averaged measurements of wafer response, a repeatable assessment of the wafer process can be obtained.

    摘要翻译: 通过采用晶圆响应的空间平均测量可以提高晶片均匀性测量的重复性。 通过增加获得测量的时间,可以显着降低噪声量,从而提高测量的重复性。 这些测量可以在晶片上的几个位置进行,以确保晶片的均匀性。 为了获得对晶圆工艺的稳定和可重复的评估,解决与损伤弛豫或不完全退火有关的不确定性,可以在远离TW测量箱的距离处执行退火衰减因子(ADF)表征。 从ADF测量和晶片响应的空间平均测量,可以获得晶片工艺的可重复评估。

    Modulated reflectance measurement system using UV probe
    8.
    发明授权
    Modulated reflectance measurement system using UV probe 有权
    使用紫外探测器的调制反射测量系统

    公开(公告)号:US08817260B2

    公开(公告)日:2014-08-26

    申请号:US12616710

    申请日:2009-11-11

    IPC分类号: G01N21/55 G01N21/63

    CPC分类号: G01N21/636 G01N21/1717

    摘要: A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

    摘要翻译: 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置,并且调制被赋予探测光束。 对于一个实施例,选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例,探针激光器被调谐以使对热探测波束调制的热波贡献最小化,或者使得等离子体波对探测光束调制的贡献均衡。

    LED solar illuminator
    9.
    发明授权
    LED solar illuminator 失效
    LED太阳能照明灯

    公开(公告)号:US08436554B2

    公开(公告)日:2013-05-07

    申请号:US13081734

    申请日:2011-04-07

    CPC分类号: H05B33/0803

    摘要: An apparatus for illuminating a target surface, the apparatus having a plurality of LED arrays, where each of the arrays has a plurality of individually addressable LEDs, and where at least one of the arrays is disposed at an angle of between about forty-five degrees and about ninety degrees relative to the target surface, where all of the arrays supply light into a light pipe, the light pipe having interior walls made of a reflective material, where light exiting the light pipe illuminates the target surface, and a controller for adjusting an intensity of the individually addressable light sources.

    摘要翻译: 一种用于照射目标表面的装置,该装置具有多个LED阵列,其中每个阵列具有多个独立可寻址的LED,并且其中至少一个阵列以大约四十五度之间的角度设置 并且相对于目标表面大约九十度,其中所有的阵列将光提供到光管中,光管具有由反射材料制成的内壁,其中离开光管的光照射目标表面,以及用于调节的控制器 独立寻址光源的强度。

    METHODS FOR DEPTH PROFILING IN SEMICONDUCTORS USING MODULATED OPTICAL REFLECTANCE TECHNOLOGY
    10.
    发明申请
    METHODS FOR DEPTH PROFILING IN SEMICONDUCTORS USING MODULATED OPTICAL REFLECTANCE TECHNOLOGY 有权
    使用调制光学反射技术在半导体中深度分布的方法

    公开(公告)号:US20100315625A1

    公开(公告)日:2010-12-16

    申请号:US12767339

    申请日:2010-04-26

    IPC分类号: G01N21/00

    摘要: Methods of obtaining dopant and damage depth profile information are disclosed using modulated optical reflectivity (MOR) measurements. In one aspect, the depth profile is constructed using information obtained from various measurements such as the junction depth, junction abruptness and dopant concentration. In another aspect, a full theoretical model is developed. Actual measurements are fed to the model. Using an iterative approach, the actual measurements are compared to theoretical measurements calculated from the model to determine the actual depth profile.

    摘要翻译: 使用调制光学反射率(MOR)测量公开了获得掺杂剂和损伤深度分布信息的方法。 在一个方面,使用从诸如结深度,结突起和掺杂剂浓度的各种测量获得的信息来构建深度分布。 另一方面,开发了一个完整的理论模型。 实际测量被馈送到模型。 使用迭代方法,将实际测量与从模型计算的理论测量值进行比较,以确定实际深度分布。