公开(公告)号：US07436505B2

公开(公告)日：2008-10-14

申请号：US11278624

申请日：2006-04-04

申请人： Alexander Belyaev ,  Daniel Kavaldjiev ,  Amith Murali ,  Aleksey Petrenko ,  Mike D. Kirk ,  David Shortt ,  Brian L. Haas ,  Kurt L. Haller

发明人： Alexander Belyaev ,  Daniel Kavaldjiev ,  Amith Murali ,  Aleksey Petrenko ,  Mike D. Kirk ,  David Shortt ,  Brian L. Haas ,  Kurt L. Haller

IPC分类号： G01N21/00

CPC分类号： G01N21/9501

摘要： Computer-implemented methods and systems for determining a configuration for a light scattering inspection system are provided. One computer-implemented method includes determining a three-dimensional map of signal-to-noise ratio values for data that would be acquired for a specimen and a potential defect on the specimen by the light scattering inspection system across a scattering hemisphere of the inspection system. The method also includes determining one or more portions of the scattering hemisphere in which the signal-to-noise ratio values are higher than in other portions of the scattering hemisphere based on the three-dimensional map. In addition, the method includes determining a configuration for a detection subsystem of the inspection system based on the one or more portions of the scattering hemisphere.

摘要翻译： 提供了用于确定光散射检查系统的配置的计算机实现的方法和系统。 一种计算机实现的方法包括：通过在检查系统的散射半球上的光散射检查系统来确定用于样本获取的数据和样本上的潜在缺陷的信噪比值的三维图 。 该方法还包括基于三维图确定散射半球的一个或多个部分，其中信噪比值高于散射半球的其它部分。 此外，该方法包括基于散射半球的一个或多个部分来确定检查系统的检测子系统的配置。

公开(公告)号：US20070229809A1

公开(公告)日：2007-10-04

申请号：US11278624

申请日：2006-04-04

申请人： Alexander Belyaev ,  Daniel Kavaldjiev ,  Amith Murali ,  Aleksey Petrenko ,  Mike Kirk ,  David Shortt ,  Brian Haas ,  Kurt Haller

发明人： Alexander Belyaev ,  Daniel Kavaldjiev ,  Amith Murali ,  Aleksey Petrenko ,  Mike Kirk ,  David Shortt ,  Brian Haas ,  Kurt Haller

IPC分类号： G01N21/88

CPC分类号： G01N21/9501

摘要： Computer-implemented methods and systems for determining a configuration for a light scattering inspection system are provided. One computer-implemented method includes determining a three-dimensional map of signal-to-noise ratio values for data that would be acquired for a specimen and a potential defect on the specimen by the light scattering inspection system across a scattering hemisphere of the inspection system. The method also includes determining one or more portions of the scattering hemisphere in which the signal-to-noise ratio values are higher than in other portions of the scattering hemisphere based on the three-dimensional map. In addition, the method includes determining a configuration for a detection subsystem of the inspection system based on the one or more portions of the scattering hemisphere.

摘要翻译： 提供了用于确定光散射检查系统的配置的计算机实现的方法和系统。 一种计算机实现的方法包括：通过在检查系统的散射半球上的光散射检查系统来确定用于样本获取的数据和样本上的潜在缺陷的信噪比值的三维图 。 该方法还包括基于三维图确定散射半球的一个或多个部分，其中信噪比值高于散射半球的其它部分。 此外，该方法包括基于散射半球的一个或多个部分来确定检查系统的检测子系统的配置。

公开(公告)号：US07479191B1

公开(公告)日：2009-01-20

申请号：US11112741

申请日：2005-04-22

申请人： William R. Entley ,  John G. Langan ,  Amith Murali ,  Kathleen Bennett

发明人： William R. Entley ,  John G. Langan ,  Amith Murali ,  Kathleen Bennett

IPC分类号： B08B3/12 ,  B08B6/00 ,  B08B7/00 ,  B08B7/02

CPC分类号： B08B7/0035 ,  C23C16/4405 ,  C23C16/52

摘要： Methods of determining the endpoint of cleaning residues from the internal surfaces of a chemical vapor deposition chamber are described. The methods are especially useful for determining when organic-based residues deposited from an ultra low-k film precursor deposition are removed from the chamber. The methods involve cleaning the chamber with a plasma comprising fluorine and oxygen while monitoring the intensity of the optical emission lines of one or more atomic or molecular species that correlate to the removal of the organic-based residues. Techniques and apparatuses for monitoring different appropriate emission lines are described. Methods of the invention can be used to prevent particle contamination during CVD operations following ultra low-k film precursor depositions and improve wafer throughput in manufacturing environments.

摘要翻译： 描述了确定化学气相沉积室内表面清洗残留物终点的方法。 该方法对于确定从超低k膜前体沉积物沉积的基于有机物的残留物是否从室中移出是特别有用的。 所述方法包括用包括氟和氧的等离子体清洁室，同时监测与去除有机基残余物相关的一种或多种原子或分子物质的光发射谱线的强度。 描述用于监测不同适当发射线的技术和装置。 本发明的方法可以用于在超低k膜前体沉积之后的CVD操作期间防止颗粒污染，并且在制造环境中提高晶片生产量。