摘要:
Embodiments in accordance with the present invention provide for forming essentially pure diastereomers of 5/6-substituted norbornene-type monomers. Further, embodiments in accordance with the present invention encompass polymerizing such diastereomers to form addition or ROMP polymers where a desired exo-/endo-ratio of the diastereomers is provided to the polymerization, such ratio designed to provide a desired ratio of endo-/exo-structured repeating units for a resulting polymer to have desired physical or chemical properties.
摘要:
Embodiments in accordance with the present invention provide for forming essentially pure diastereomers of 5/6-substituted norbornene-type monomers. Further, embodiments in accordance with the present invention encompass polymerizing such diastereomers to form addition or ROMP polymers where a desired exo-/endo-ratio of the diastereomers is provided to the polymerization, such ratio designed to provide a desired ratio of endo-/exo-structured repeating units for a resulting polymer to have desired physical or chemical properties.
摘要:
Embodiments in accordance with the present invention provide for forming essentially pure diastereomers of 5/6-substituted norbornene-type monomers. Further, embodiments in accordance with the present invention encompass polymerizing such diastereomers to form addition or ROMP polymers where a desired exo-/endo-ratio of the diastereomers is provided to the polymerization, such ratio designed to provide a desired ratio of endo-/exo-structured repeating units for a resulting polymer to have desired physical or chemical properties.
摘要:
Embodiments of the present invention are directed generally to methods for producing high purity exo-alkenylnorbornenes from a mixture of conformational isomers thereof.
摘要:
Embodiments of the present invention are directed generally to methods for producing high purity exo-alkenylnorbornenes from a mixture of conformational isomers thereof.
摘要:
Polymeric compositions for semiconductor applications comprising 10 to 99 wt. % of norbornene-type cycloolefin monomers represented by one or more of Formulae I(a), I(b), and optionally I(c) and/or I(d), 0.0005 to 0.5 wt. % of an addition polymerization procatalyst, and optionally: up to 0.5 wt. % of a cocatalyst, up to 59 wt. % of a crosslinking monomer, up to 50 wt. % of a viscosifier, up to 20 wt. % of a thixotropic additive(s), up to 80 wt. % of a filler, up to 10 wt. % of an antioxidant, and up to 0.6 wt. % of an antioxidant synergist, the total of the components of the formulation adding up to 100%. Such formulations are mass polymerized, or cured, to form polymeric compositions that have properties desirable for a variety of specific electronic, microelectronic, optoelectronic and micro-optoelectronic applications such as die attach adhesives, underfill materials, prepreg binders, encapsulants, protective layers, and other related applications.
摘要:
Embodiments in accordance with the present invention encompass negative-tone, aqueous base developable, self-imageable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.
摘要:
A polymer includes a first type of repeat unit represented by Formula I: where X is selected from —CH2—, —CH2—CH2—, or —O—; m is an integer from 0 to about 5; and where for the first type of repeat unit one of R1, R2, R3, and R4 is one of a maleimide containing group and for the second type of repeat unit one of R1, R2, R3, and R4 is a hindered aromatic group, a C8 or greater alkyl group, a C4 or greater halohydrocarbyl or perhalocarbyl group, a C7 or greater aralkyl group, or a heteroatom hydrocarbyl or halohydrocarbyl group.
摘要:
Polymeric compositions for semiconductor applications comprising 10 to 99 wt. % of norbornene-type cycloolefin monomers represented by one or more of Formula I(a), I(b), and optionally I(c) and/or I(d), 0.0005 to 0.5 wt. % of an addition polymerization procatalyst, and optionally: up to 0.5 wt. % of a cocatalyst, up to 59 wt. % of a crosslinking monomer, up to 50 wt. % of a viscosifier, up to 20 wt. % of a thixotropic additive(s), up to 80 wt. % of a filler, up to 10 wt. % of an antioxidant, and up to 0.6 wt. % of an antioxidant synergist, the total of the components of the formulation adding up to 100%. Such formulations are mass polymerized, or cured, to form polymeric compositions that have properties desirable for a variety of specific electronic, microelectronic, optoelectronic and micro-optoelectronic applications such as die attach adhesives, underfill materials, prepreg binders, encapsulants, protective layers, and other related applications.
摘要:
Embodiments in accordance with the present invention encompass negative-tone, aqueous base developable, self-imageable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.